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Parameter Extraction for Advanced MOSFET Model using Particle Swarm Optimization

Thakker R.A., Patil M.B., Anil K.G., Indian Institute of Technology, IN
In the sub 100-nm regime, MOSFET parameter extraction has become a challenging task. Commonly used gradient based methods have many difficulties such as good initial guess requirement, singularities in objective functions, etc. Genetic Algorithm (GA), [...]

An Improved Impact Ionization Model for SOI Circuit Simulation

Xi X., Li F., Liu W., Tudor B., Wang P., Wang W., Liu W., Lee F., Wang P., Wang W., Subba N., Goo J-S, Synopsys, Inc., US
The impact ionization (II) model accuracy issue in industry standard SOI MOSFET is discussed in the paper. Based on Medici 2D simulation study, an improved impact ionization model is proposed which can capture the voltage [...]

Analytical Modelling and Performance Analysis of Double-Gate MOSFET-based Circuit Including Ballistic/quasi-ballistic Effects

Martinie S., CEA/LETI/MINATEC, FR
As the MOSFET continues to shrink rapidly, emerging physical phenomena, such as ballistic transport, have to be considered in the modelling and simulation of ultra-scaled devices. Future Double-Gate MOSFETs, designed with channel lengths in the [...]

Process Aware Compact Model Parameter Extraction for 45 nm Process

Karmarkar A.P., Dasarapu V.K., Saha A.R., Braun G., Krishnamurthy S., Lin X-W, Synopsys (India) Pvt. Ltd., IN
The current industry trends call for smaller devices and decreasing feature sizes with each technology node. The process variability has a significant impact on the device characteristics for deep sub-micron technologies because of the smaller [...]

Effective Drive Current in CMOS Inverters for Sub-45nm Technologies

Hu J., Park J-E, Freeman G., Wong H.S.P., Stanford University, US
We propose a new model for the effective drive current (Ieff) of CMOS inverters, where the maximum FET current obtained during inverter switching (Ipeak) is a key parameter. Ieff is commonly defined as the average [...]

Modeling of gain in advanced CMOS technologies

Spessot A., Gattel F., Fantini P., Marmiroli A., STMicroelectronics, IT
The impressive downscaling of CMOS technology and its more and more massive introduction in System-on-chip (SoC) oriented applications require comprehensive modeling approach able to describe such different world (digital and analog) starting from a single [...]

Model Implementation for Accurate Variation Estimation of Analog Parameters in Advanced SOI Technologies

Suryagandh S., Subba N., Wason V., Chiney P., Wu Z-Y, Chen B.Q., Krishnan S., Rathor M., Icel A., Advanced Micro Devices, US
Analog design uses transistors with longer channel length for high performance. gm, Rout and intrinsic gain form the matrix to gauge this performance. It is critical to design these circuits for manufacturing variability. This work [...]

Modeling of Spatial Correlations in Process, Device, and Circuit Variations

Lu N., IBM, US
We present an innovative method to model the spatial correlations in semiconductor process and device variations or in VLSI circuit variations. Without using the commonly adopted PCA approach, we give a very compact expression to [...]

An Iterative Approach to Characterize Various Advanced Non-Uniformly Doped Channel Profiles

Kaur R., Chaujar R., Saxena M., Gupta R.S., University of Delhi, IN
Since past three decades, in the pursuit of superior performances relative to high-speed circuits and packing density, miniaturization of device dimensions has been adopted as a powerful tool. Gradually, as device feature sizes move into [...]

Compact Modeling of Noise in non-uniform channel MOSFET

Roy A.S., Enz C.C., Lim T.C., Danneville F., CSEM & EPFL, CH
Compact MOSFET noise models are mostly based on the Klaassen-Prins (KP) method. However, the noise properties of lateral nonuniform MOSFETs are considerably different from the prediction obtained with the conventional KP based methods which, at [...]

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