Nanoelectronics – Page 43 – TechConnect Briefs

Multifunctional Materials Based on Chitosan, Globular Protein and Gold Nanoparticles

Indrea E., Dreve S., Bratu I., Mihailescu G., Olenic L., Tomoaia G., Tomoaia-Cotisel M., Mocanu A., Horovitz O., Tomoaia-Cotisel M., Babes-Bolyai University of Cluj-Napoca, RO

Our studies are focused on the structure of thin films of chitosan and of globular protein in both the absence and the presence of negatively charged gold nanoparticles. Deacetilated chitosan of high molecular weight and [...]

Synthesis and Characterizations of ZnO Nanorods Arrays for Solar Cell and Chemical Sensor Applications

Lupan O., Chow L., University of Central Florida, US

Synthesis of nanorod based solar cells and sensors are quickly directed towards developing alternative, lightweight, flexible nanodevices for wide area of commercial applications. Many research papers has been published, in recent years, in the area [...]

Fabrication of Perforated Membranes in Polymers by Imprint Lithography

Roychowdhury A., Park S., Louisiana State University, US

The ability to imitate architecture of naturally existing systems in an economical way is important because this will provide platform for various fundamental and applied research activities. One such structure is a perforated membrane having [...]

Nanostructuration of sol-gel thin films

Peroz C., Goletto V., Foresti M., Heitz C., Le Gratiet L., Barthel E., Sondergard E., Laboratoire mixte CNRS/Saint-Gobain, FR

Sol-gel chemistry is very versatile and structuring sol-gel materials will allow a fine tuning of chemistry, electromagnetic, optical and mechanical properties. We explore the possibilities to combine sol-gel chemistry to large scale patterning at low [...]

Nanoimprint Mold Manufacturing with Focused Ion Beam

Chung M., Huang B.R., Weng M.H., Fu C.S., Chang Y.Y., Lai S.W., Chiou J.M., Chen Y-C, Tzeng Y.H., Southern Taiwan University of Technology, TW

Nanoimprint lithography (NIL) is an emerging low cost technique for reproducing sub-100 nm pattern in various applications; however, manufacturing the mold for nanoimprint has been a key issue both in expense and resolution. Focused Ion [...]

Numerical Simulation of NIL Process Based on Continuum hypothesis

Kim S.M., Woo Y.S., Lee D.E., Lee W.I., Lee D.E., Lee W.I., Seoul Nat'l Univ., KR

Nano imprint lithography(NIL) is a cost-efficient, high-throughput processing technique to transfer nano-scale patterns onto thin polymer films. Polymers used as the resist include UV cured resins as well as thermoplastics such as polymethyl-methacrylate(PMMA). In this [...]

Femtosecond laser micromachining of IC for semiconductor defect analysis

Halbwax M., Sarnet T., Hermann J., Delaporte Ph., Sentis M., Fares L., Haller G., LP3 UMR CNRS 6182, FR

The detection and analysis of defects in Integrated Circuits (IC) are major challenges faced by the semiconductor industry as outlined by the roadmap in the latest International Technology Roadmap for Semiconductors (ITRS). Advanced tools used [...]

Resist Mask Designs for Quantum Dot Transistor Using E-Beam Nanolithography

Hashim U., Sutikno S., Jamal Z.A.Z., Northern Malaysia University College of Engineering (KUKUM), MY

Quantum dot single electron transistor (QD SET) can be fabricated using e-beam nanolithography (EBL) and then continued by combination process of pattern dependent oxidation (PADOX) and high density plasma etching. EBL was used to pattern [...]

DIRECT: An Efficient Optimization Scheme for Mask Generation Using Inverse Lithography

Xiong W., Tsai M-C, Zhang J., Yu Z., Tsinghua University, CN

Resolution Enhancement Technologies (RETs) are widely used to cope with the severe optical effects that are manifests in sub-wavelength lithography. Inverse Lithography Technique (ILT) has recently been proposed [1-3] as an effective RET for sub [...]

Topic: Nanoelectronics