Nanoimprint lithography (NIL) is an emerging low cost technique for reproducing sub-100 nm pattern in various applications; however, manufacturing the mold for nanoimprint has been a key issue both in expense and resolution. Focused Ion Beams (FIB) has been applied in TEM sample preparation and others, its extremely small throughput but very well defined beam make it a perfect tool for such job. The combination of these two presents a new opportunity for both techniques. We find features of 50 nm can be easily made with FIB, the actual line width to beam diameter ratio is around 6 for an aspect ratio less than 2. Higher aspect ratio is not recommended. For features smaller than 50 nm, re-deposition can cause blurring of features. Re-deposition can be reduced by a shorter dwell time or gas-assisted etching. There is a trade off between dwell time and feature integrity. Best results can be achieved with high hardness materials; the lack of conductivity for some materials can be remedied with s thin layer of Pt coating on the surface before FIB jobs, but then has to be removed for nanoimprint.
Journal: TechConnect Briefs
Volume: 4, Technical Proceedings of the 2007 NSTI Nanotechnology Conference and Trade Show, Volume 4
Published: May 20, 2007
Pages: 446 - 449
Industry sector: Advanced Materials & Manufacturing
Topicss: Advanced Manufacturing, Nanoelectronics