Numerical Simulation of NIL Process Based on Continuum hypothesis

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Nano imprint lithography(NIL) is a cost-efficient, high-throughput processing technique to transfer nano-scale patterns onto thin polymer films. Polymers used as the resist include UV cured resins as well as thermoplastics such as polymethyl-methacrylate(PMMA). In this study, an analytic investigation was performed for the NIL process of transferring nano-scale patterns onto polymeric films. Process optimization calls for a thorough understanding of polymer flow during the process. We carried out 2D and 3D numerical analyses of polymer flow during NIL process. The simulation incorporated continuum-hypothesis and the effects of surface tension were taken into account. The numerical model also employed a proper viscosity model for polymeric liquid. For a more effective prediction of free surface, fixed grid scheme with the volume of fluid (VOF) method were used. A parametric study was performed for various process conditions and the simulation results were verified with experimental results qualitatively.

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Journal: TechConnect Briefs
Volume: 4, Technical Proceedings of the 2007 NSTI Nanotechnology Conference and Trade Show, Volume 4
Published: May 20, 2007
Pages: 442 - 445
Industry sector: Advanced Materials & Manufacturing
Topics: Advanced Manufacturing, Nanoelectronics
ISBN: 1-4200-6376-6