Hashim U. – TechConnect Briefs

Resist Mask Designs for Quantum Dot Transistor Using E-Beam Nanolithography

Hashim U., Sutikno S., Jamal Z.A.Z., Northern Malaysia University College of Engineering (KUKUM), MY

Quantum dot single electron transistor (QD SET) can be fabricated using e-beam nanolithography (EBL) and then continued by combination process of pattern dependent oxidation (PADOX) and high density plasma etching. EBL was used to pattern [...]

Nanowire formation for Single Electron Transistor using SEM Based Electron Beam Lithography (EBL) Technique: Positive Tone Vs Negative Tone E-beam Resist

Nuzaihan M., Hashim U., Halim N.H.A., Bajuri S.N.M., Northern Malaysia University College of Engineering, MY

Experimental studies of nanowires formation are carried out. The nanowires are fabricated using Scanning Electron Microscope Based Electron Beam Lithography (EBL) Technique with critical dimensions in less than 100nm. In order to complete the design [...]