Nanoimprint Mold Manufacturing with Focused Ion Beam
Chang Y.Y., Chen Y-C, Chiou J.M., Chung M., Fu C.S., Huang B.R., Lai S.W., Tzeng Y.H., Weng M.H., Southern Taiwan University of Technology, TW
Nanoimprint lithography (NIL) is an emerging low cost technique for reproducing sub-100 nm pattern in various applications; however, manufacturing the mold for nanoimprint has been a key issue both in expense and resolution. Focused Ion [...]