compact modeling – Page 3 – TechConnect Briefs

A Carrier-Based Analytic Model for Undoped Ultra-Thin-Body Silicon-on-Insulator (UTB-SOI) MOSFETs

He J., Bian W., Tao Y., Li B., Chen Y., Peking University, CN

A carrier-based analytical model for undoped (lightly doped) UTB-SOI MOSFETs is derived by solving the Poisson equation coupled to the Pao-Sah current formulation. It is also shown that the predicted I-V characteristics are in complete [...]

LINFET: A BSIM class FET model with smooth derivatives at Vds=0

Wagner L., Olsen C.M., IBM Systems Technology Group, US

The linearity of compact transistor models near Vds=0 is important for designing RF circuits. Currently compact models such as BSIM3/4 have problems around this bias point due to discontinuities in the derivatives. Recently, the PSP [...]

Gummel Symmetry with Higher-order Derivatives in MOSFET Compact Models

See G.H., Zhou X., Chandrasekaran K., Chiah S.B., Zhu G.J., Zhu Z.M., Lim G.H., Wei C.Q., Lin S-H, Zhu G.J., Zhu Z.M., Nanyang Technological University, SG

One of the critical problems in Gummel symmetry at higher-order derivatives that still exists in current and next generation MOS compact models has been solved with a simple modification of the mathematical smoothing function. The [...]

Compact modeling of drain current in Independently Driven Double-Gate MOSFETs

Munteanu D., Autran J-L, Loussier X., Tintori O., L2MP-CNRS, FR

As CMOS scaling is approaching its limits, Double-Gate (DG) MOSFET is envisaged as a possible alternative to the conventional bulk MOSFET. In spite of excellent electrical performances due to its multiple conduction surfaces, conventional DG [...]

Impact of Gate Induced Drain Leakage and Impact Ionization Currents on Hysteresis Modeling of PD SOI Circuits

Chen Q., Suryagandh S., Goo J-S, An J.X., Thuruthiyil C., Icel A.B., Advanced Micro Devices, US

The impact of the gate induced drain leakage and impact ionization currents on hysteresis of PD FB SOI circuits is examined, and a physical understanding is provided. Measured silicon data from 90nm and 65nm PD [...]

Unified Compact Model for Generic Double-Gate MOSFETs

Zhou X., See G.H., Zhu G.J., Zhu Z.M., Chandrasekaran K., Zhu G.J., Zhu Z.M., Rustagi S.C., Lin S-H, Wei C.Q., Lim G.H., Nanyang Technological University, SG

A generic double-gate (DG) MOSFET follows a generalized (input) voltage equation from the first integral of Poisson equation and Gauss' law at the two gates, which is implicit and, in general, non-integrable when the channel [...]

Compact Modeling of Threshold Voltage in Nanoscale Strained-Si/SiGe MOSFETs

Nawal S., Venkataraman V., Kumar M.J., Indian Institute of Technology, IN

A simplae compact model for the threshold voltage of Strained Si/SiGe MOSFET is reported for the first time. This model accurately predicts the effects of Ge content and other device parameters on threshold voltage. The [...]

Dynamic Behavior Model for High-k MOSFETs

Dunga M.V., Xi X., Niknejad A.M., Hu C., University of California-Berkeley, US

High-K dielectrics need to be introduced into bulk CMOS to extend the scaling limits. However, the use of high-k dielectrics introduces new dynamic behavior into transistor operation. Pulsed measurements show hysteresis in drain current (Id), [...]

Compact Model of drain-current in Double-Gate MOSFETs including carrier quantization and short-channel effects

Loussier X., Munteanu D., Autran J-L, Harrison S., Cerutti R., L2MP, FR

Double-Gate (DG) structure has been in the last years the object of intensive research because its enormous potentiality to push back the integration limits to which conventional devices are subjected. Although the operation of DG [...]

Compact Modeling of Doped Symmetric DG MOSFETs with Regional Approach

Chandrasekaran K., Zhu Z.M., Zhou X., Shangguan W., See G.H., Chiah S.B., Rustagi S.C., Singh N., Nanyang Technological University, SG

A compact model for the explicit surface potential equation of doped symmetric double-gate MOSFET from Poisson equation with regional approach is presented. It’s scalable for all doping and channel thicknesses and has been proved to [...]