JP – Page 22 – TechConnect Briefs

New Localized Surface Plasmon Resonance Sensor Utilizing Nanoimprinting Technology

Matsushita T., Nishikawa T., Yamashita H., Nakamura M., Hasui R., Aoyama S., OMRON Corporation, JP

A new localized surface plasmon resonance sensor fabricated by the nanoimprinting technique is presented. Nanoimprinting, one of the most important nanofabrication technologies, can produce stable nanopatterns on a substrate with high throughput. In this study, [...]

Novel Function of the Boron Icosahedron; a New Mediator of Magnetic Interaction

Mori T., National Institute for Materials Science, JP

Rare earth borides containing the B12 icosahedron display surprisingly strong magnetic interactions although they are magnetically dilute insulating materials with localized f-electrons. A microscopic local probe, ESR, was utilized to investigate the mechanism of the [...]

HiSIM: Accurate Charge Modeling Important for RF Era

Miura-Mattausch M., Navarro D., Ueno H., Mattausch H.J., Miura-Mattausch M., Morikawa K., Itoh S., Kobayashi A., Masuda H., Hiroshima University, JP

Extension of the gradual-channel approximation is presented with the surface-potential-based MOSFET modeling. All phenomena observed under the saturation condition are described by the potential increase in the pinch-off region in a self-consistent way. The charge [...]

Noise Modeling with HiSIM Based on Self-Consistent Surface-Potential Description

Miura-Mattausch M., Hosokawa S., Navarro D., Matsumoto S., Ueno H., Mattausch H.J., Miura-Mattausch M., Ohguro T., Iizuka T., Taguchi M., Kage T., Miyamoto S., Hiroshima University, JP

Accurate prediction of noise characteristics is a prerequisite for RF-circuit simulation. We demonstrate here that the 1/f noise is modeled only with the trap density as a model parameter and the thermal drain noise is [...]

HiSIM-1.2: The Effective Gate Length Validation with the Capacitance Data

Iino Y., Silvaco Japan, JP

HiSIM-1.2 model parameter extraction and the resulted fit for the current voltage characteristics were reported at WCM-2004 (Boston, MA, 2004). The measurement curves were reproduced well. However, the Cgc (the gate to the shorted source/drain) [...]

Device Parameter Extraction from Fabricated Double-Gate MOSFETs

Tsutsumi T., Liu Y., Nakagawa T., Sekigawa T., Hioki M., Suzuki E., Koike H., National Institute of Advanced Industrial Science and Technology (AIST), JP

Accurate spice simulation needs parameter extraction of the fabricated DG-MOSFETs with good electrical characteristics. However, it is very difficult to fabricate such good DG-MOSFETs, so that device parameter extraction of the fabricated DG-MOSFETs has been [...]

Compact Model for Ultra-Short Channel Four-Terminal DG MOSFETs for Exploring Circuit Characteristics

Nakagawa T., Sekigawa T., Tsutsumi T., Hioki M., Suzuki E., Koike H., National Institute of Advanced Industrial Science and Technology (AIST), JP

We have proposed a compact model of the DG MOSFETs which handles two gates independently. The model can simulate the DG MOSFETs of asymmetric gate design, together with their four-terminal operation. In this report, we [...]

The Surface-Potential-Based model HiSIM-SOI and its Application to 1/f Noise in Fully-Depleted SOI-MOSFETs

Sadachika N., Yusoff M.Md., Uetsuji Y., Bhuyan M.H., Kitamaru D., Mattausch H.J., Miura-Mattausch M., Miura-Mattausch M., Weiss L., Feldmann U., Baba S., Graduate School of Advanced Sciences of Matter, Hiroshima University, JP

Fully-depleted SOI-MOSFET model HiSIM-SOI for circuit simulation is developed. HiSIM-SOI solves surface potentials at all three SOI-surfaces along the depth direction self-consistently. Besides comparison to measured I-V characteristics, the model is verified with 1/f noise [...]

RF-MOSFET Model Parameter Extraction with HiSIM

Miura-Mattausch M., Sadachika N., Murakawa M., Mimura S., Higuchi T., Itoh K., Inagaki R., Iguchi Y., Hiroshima University, JP

This paper discusses a feasibility of an automatic parameter extraction method with the GA (Genetic Algorithm) for surface-potential-based MOSFET model HiSIM (Hiroshima-university STARC IGFET Model), where all device characteristics are described as functions of the [...]

Molecular Communication

Hiyama S., Moritani Y., Suda T., Egashira R., Enomoto A., Moore M., Nakano T., NTT DoCoMo, Inc., JP

This abstract describes research challenges in Molecular Communication, a new and interdisciplinary research area that spans the nanotechnology, biotechnology, and communication technology. Molecular communication allows nanomachines to communicate using nano-scale particles. Molecular communication is inspired [...]