BSIM-MG is a surface-potential based compact model for multi-gate MOSFETs such as FinFETs fabricated on either SOI or bulk substrates. It can model transistors with the gate controlling two, three, or four sides of the fin. The effects of body doping are modeled. It can also model a double-gate transistor with independently biased top and bottom gates and asymmetric top and bottom gate work- functions and dielectric thicknesses. It supports high performance metal-gate technologies as well low-cost polysilicon-gate memory technologies.
Journal: TechConnect Briefs
Volume: 3, Technical Proceedings of the 2007 NSTI Nanotechnology Conference and Trade Show, Volume 3
Published: May 20, 2007
Pages: 512 - 514
Industry sector: Sensors, MEMS, Electronics
Topic: Compact Modeling