Kim J-S – TechConnect Briefs

Morphology and Size Control of Mesoporous ORMOSIL Particles

Jung G.I., Kim J-S, Koo S.M., Hanyang University, KR

Mesoporous ORMOSIL particles with tailored morphology and/or controlled size were prepared by a simple two-step process. The first step, synthesis of monodisperse ORMOSIL particles with multi-layered structure, involved a one-pot process in an aqueous solution [...]

A MEMS-type Micro Sensor for Hydrogen Gas Detection

Yoon J-H, Kim B.-J., Kim J-S, Kim B.-J., Kim J-S, University of Seoul, KR

In this study, a highly sensitive hydrogen gas sensor of the multi-layer and micro-heater type was designed and fabricated using a microelectromechanical system (MEMS) process. The dimension of fabricated hydrogen gas sensor was 5 mm×4 [...]

Topology Optimization of Ultrasonic Transducers for Microsystem and IC Packaging

Kim J-M, Kim J-S, Kim J-M, Kim J-S, Lee S.I., Lim E.J., University of Seoul, KR

In this study, we introduce the method of topology optimization for piezoelectric transducers including ultrasonic tool horns for flip chip or wire bonding. Topology optimization performs an optimization with the objective function regardless of initial [...]

Dispersion of chemically-modified graphene and its applications

Han J.T., Kim J-S, Kim S-H, Kim J-S, Kim S-H, Jeong H.J., Jeong S.Y., Jeong H.J., Jeong S.Y., Lee G.W., Korea Electrotechnology Research Institute, KR

In this study, we present straightforward methods to produce large-area GO sheets with fewer defects on the basal plane and for addressing the problems associated with dispersing reduced GO nanosheets in organic solvents for applications. [...]

Large Area Replication of AAO Nanostructure Using a Solvent Exchange Method and UV-curable Polymers

Kim J-S, Lee K.B., Lee W., Lee K.B., Lee W., Korea university, KR

We made a successful fabrication of nanopatterns with various UV curable materials, 311RM, Ethylene glycol dimethacrylate (EGDA), 4-hydroxy butyl acrylate (4-HBA) and pyrrole. AAO nanopatterns larger than 5 cm 5 cm were successfully replicated. It [...]

Quantitative Synchrotron Grazing Incidence X-ray Scattering and Reflectivity Analysis of Nano-structures and Patterns Supported with Substrates

Ree M., Yoon J., Heo K., Jin K.S., Jin S., Jin K.S., Jin S., Lee B., Park I., Park Y.H., Choi S.C., Kim G., Kim H., Kim J-S, Kim J., Kim K.W., Kim G., Kim H., Kim J-S, Kim J., Kim K.W., Oh W., Park I., Park Y.H., Hwang Y., Kim G., Kim H., Kim J-S, Kim J., Kim K.W., Kim G., Kim H., Kim J-S, Kim J., Kim K.W., Kim G., Kim H., Kim J-S, Kim J., Kim K.W., Chang T., Pohang University of Science & Technology, KR

Single-layer, multi-layer, and patterned nanostructures were fabricated with aids of substrates from various material systems (polymers, diblock copolymers, polymer blends, alumina precursors, silane precursor, etc.) using wet spin-coating and subsequent dry and thermal process, chemical [...]

Atomistic Modeling for Boron Diffusion in Strained Silicon Substrate

Kim H-G, Kim J-S, Kim Y.K., Yoon K-S, Kim H-G, Kim J-S, Kim Y.K., Kim H-G, Kim J-S, Kim Y.K., Won T., Inha University, KR

We report our KMC study on the effect of strain on B diffusion in silicon and relaxed SiGe layer by assuming a virtual strained structure with charged defect energy and diffusivity. The simulation results imply [...]

Kinetic Monte Carlo Study on Silicon Pre-Implant Technique

Kim J-S, Kim Y.K., Kim J-S, Kim Y.K., Yoon K-S, Won T., Inha univ., KR

In this work, we investigated the effect of Si pre-implantation on the low energy B implant and boron activation enhancement during the post-implant annealing process using KMC. For investigating Si pre implantation effect, Si implantation [...]

Minimized atomistic model (MAM) of BmIn cluster and the effect of Ge pre-amorphization implant (Ge-PAI) on boron diffusion

Yoo J-H, Yoon K-S, Hwang C-O, Yoon K-S, Kim J-S, Won T., School of Engineering, National IT Research Center for Computational Electronics, Inha University, KR

In this paper, we report on our minimized atomistic model (MAM) composed of the evolution path from B2I to B3I for describing kinetic Monte Carlo (KMC) in boron diffusion. MAM, which is based on the [...]