Ree M., Yoon J., Heo K., Jin K.S., Jin S., Jin K.S., Jin S., Lee B., Park I., Park Y.H., Choi S.C., Kim G., Kim H., Kim J-S, Kim J., Kim K.W., Kim G., Kim H., Kim J-S, Kim J., Kim K.W., Oh W., Park I., Park Y.H., Hwang Y., Kim G., Kim H., Kim J-S, Kim J., Kim K.W., Kim G., Kim H., Kim J-S, Kim J., Kim K.W., Kim G., Kim H., Kim J-S, Kim J., Kim K.W., Chang T.
Pohang University of Science & Technology, KR
Single-layer, multi-layer, and patterned nanostructures were fabricated with aids of substrates from various material systems (polymers, diblock copolymers, polymer blends, alumina precursors, silane precursor, etc.) using wet spin-coating and subsequent dry and thermal process, chemical vapor deposition, and atomic layer deposition. These nanostructured sample specimens were investigated by means of synchrotron X-ray scattering, in particular grazing incidence X-ray scattering (GIXS), and specular X-ray reflectivity (SXR). This study successfully demonstrated that X-ray and neutron scattering and reflectivity techniques are very powerful to quantitatively characterize the structure and property details in nanostructure systems. These analyses provide all details in the structure and layer components, orientation, distortions, phase transformation, electron density and profiles, surface structure and roughness, and miscibility. All GIXS and SXR measurements were performed at the Pohang Accelerator Laboratory (PAL). All the results will be discussed with considering the chemical nature of materials, process conditions, and interfacial characteristics, as well as the resolution limit of the employed techniques.
Journal: TechConnect Briefs
Volume: 4, Technical Proceedings of the 2007 NSTI Nanotechnology Conference and Trade Show, Volume 4
Published: May 20, 2007
Pages: 1 - 4
Industry sector: Advanced Materials & Manufacturing
Topic: Materials Characterization & Imaging