nanoimprint lithography – TechConnect Briefs

Low-Cost Nano-Manufacturing of Surface Acoustic Wave Devices by Use of Jet & Flash Nano Imprint Lithography

Pedersen C.M., Braun L., Ballandras S., Plessky V., De Joffrey P., Boillot P., Renaud S., Girardet E., Bro T.H., Bilenberg B., Gegot F., Davis Z.J., Danish Technological Institute, DK

Surface acoustic wave (SAW) devices have many applications and can be found in common consumer electronics such as mobile phones, WiFi and GPS. Beside its use in electronics they can also be used as a [...]

A Study on Numerical Analysis of Stress Distribution for Thermal Nanoimprint Lithography Process

Cho B-G, Won T., Inha University, KR

We investigated the deformation of the viscoelastic polymethyl methacrylene (PMMA) resist wherein a rigid SiO2 stamp with a rectangular line pattern is imprinted for thermal nano-imprint lithography (NIL). We calculated the stress distribution in the [...]

The IMPRINT software: quantitative prediction of process parameters for successful nanoimprint lithography

Kehagias N., Reboud V., Sotomayor Torres C.M., Sirotkin V., Svintsov A., Zaitsev S., IMT RAS, RU

A homogeneous residual layer thickness in nanoimprint lithography (NIL) can be achieved by optimizing the NIL stamp geometry (the distribution of cavities and protrusions, the stamp cavities depth and the stamp thickness) as well as [...]

Periodic Nanowell Array using Template-Assisted Nanosphere Lithography

Jung S., Lee J., Seoul National University, KR

This paper presents a template-assisted nanosphere lithography(NSL) to obtain high-quality crystal in regularity and coverage(Figure 1). A periodic array of 100-nm deep, 360-450 nm wide nano-trenches was fabricated by nano imprint lithography(NIL), and used as [...]

Refined coarse-grain modeling of stamp deformation in nanoimprint lithography

Merino S., Retolaza A., Juarros A., Schift H., Sirotkin V., Svintsov A., Zaitsev S., IMT RAS, RU

The inhomogeneous distribution of the residual layer thickness is a vital issue in nanoimprint lithography (NIL). Using the simulation of NIL, this problem can be alleviated by optimizing the stamp geometry and by choosing process [...]

Numerical Stress Analysis on Thermal Nano-Imprint Lithography

Cho B-G, Park S.Y., Won T., Inha University, KR

This paper investigations the stress distribution of the polymer through numerical simulations during thermal NIL. Numerical results explained characteristic phenomena which never appear in continuous line-and-space patterning cases. We believe that numerical simulations with more [...]

Fabrication Process of 3D-photonic crystals via UV-Nanoimprint Lithography

Glinsner T., Lindner P., Mühlberger M., Bergmair I., Schöftner R., Hingerl K., EV Group, AT

UV-based Nanoimprint Lithography (UV-NIL) offers several decisive technical advantages concerning overlay alignment accuracy, simultaneous imprinting of micro- and nanostructures and tool design. A variety of potential applications has been demonstrated by using Nanoimprint Lithography (e.g. [...]

A Highly Reliable Pattern Transfer of Hydrogen Silsequioxane

Liu J.F., Chen H.J.H., Chen S.Z., Chen H.J.H., Chen S.Z., Huang F.S., National Tsing Hua University, TW

In this paper, we focus on the effects of process parameters on pattern embossing into HSQ films, and the pattern degradation of HSQ for room temperature aging effects. The dilution of HSQ affects not only [...]