Periodic Nanowell Array using Template-Assisted Nanosphere Lithography


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This paper presents a template-assisted nanosphere lithography(NSL) to obtain high-quality crystal in regularity and coverage(Figure 1). A periodic array of 100-nm deep, 360-450 nm wide nano-trenches was fabricated by nano imprint lithography(NIL), and used as the template. When polystyrene nanoshperes were spin coated on the substrate with the template morphology, they formed a crystal array with improved periodicity in lateral and longitudinal directions. We also demonstrate nanowell array through subsequent deposition and lift-off steps.

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Journal: TechConnect Briefs
Volume: 1, Nanotechnology 2008: Materials, Fabrication, Particles, and Characterization – Technical Proceedings of the 2008 NSTI Nanotechnology Conference and Trade Show, Volume 1
Published: June 1, 2008
Pages: 588 - 591
Industry sector: Advanced Materials & Manufacturing
Topics: Advanced Manufacturing, Nanoelectronics
ISBN: 978-1-4200-8503-7