A homogeneous residual layer thickness in nanoimprint lithography (NIL) can be achieved by optimizing the NIL stamp geometry (the distribution of cavities and protrusions, the stamp cavities depth and the stamp thickness) as well as by choosing NIL process parameters (the initial resist thickness, the imprint temperature and the duration of the imprint). This optimization produces the greatest benefit if its implementation is performed before expensive stamp manufacturing starts. To do this requires an effective tool for the simulation of NIL process. A coarse-grain method for simultaneous calculation of the resist viscous flow in NIL and the stamp/substrate deformation has been presented earlier. The method has been realized in the IMPRINT software for the verification of NIL parameters on standard Personal Computers, by using the GDS data of the stamp design. The experiments were performed for different values of the stamp cavities depth and at different values of the imprint temperature (in other words, at different values of the resist dynamic viscosity). A very good agreement between simulation and experimental results has been obtained. The results confirm the potential of the IMPRINT software as an efficient tool for optimizing the NIL process.
Journal: TechConnect Briefs
Volume: 3, Nanotechnology 2008: Microsystems, Photonics, Sensors, Fluidics, Modeling, and Simulation – Technical Proceedings of the 2008 NSTI Nanotechnology Conference and Trade Show, Volume 3
Published: June 1, 2008
Pages: 553 - 556
Industry sectors: Advanced Materials & Manufacturing | Sensors, MEMS, Electronics
Topics: Informatics, Modeling & Simulation