lithography – TechConnect Briefs

Advanced large scale colloidal lithography for sub-100 nm direct and indirect nanostructuring: application to silicon and metals

Kadiri H., Faustini M., Turover D., Grosso D., Gokarna A., Lerondel G., Université de Technologie de Troyes, FR

Actually nano-sphere lithography is a great technique to fabricate structures at large scale, therefore using self-assembly as a bottom-up approach nano scale materials. In this study, combining Reactive Ion Etching(RIE) and polystyrene(PS) nano-sphere lithography we [...]

Nanopatterned coatings for advanced glass products

McMackin I., Geddes J., Aryal M., Seitz O., Kobrin B., Rolith, Inc., US

A wide variety of glass products would greatly benefit from coatings that offer anti-reflective, anti-glare, anti-fog, anti-ice, self-cleaning, and other advanced functions. State-of-the-art coatings do not meet desired performance characteristics or cannot be applied over [...]

Milling Process Control with Dimensional Feedback on a Focused Ion Beam – Scanning Electron Microscope System (FIB-SEM)

Sanabia J.E., Raith USA, Inc., US

In nanofabrication and nanoanalysis, focused ion beam – scanning electron microscope (FIB-SEM) systems are increasingly used for demanding patterning tasks which rely on precise pattern placement and/or dimension control. Easily verifying and correcting for patterning [...]

Patterning Technology for Nanomanufacturing

Smith H.I., Walsh M., Zhang F., Hourihan G., Ferrera J., Jaspan M., LumArray, US

We describe a new approach to patterning that circumvents the limitations of techniques that were developed for the semiconductor industry. The new approach, zone-plate-array lithograhy (ZPAL)will enable an expansion of applications of nanoscale science and [...]

Fabrication of biodegradable zein films by using soft lithography

Altunakar B., Kokini J.L., University of Illinois at Urbana-Champaign, US

Microfluidic components are widely used in the design of both bioanalytical and diagnostic microdevices. The miniaturized sample volumes together with modifications of the surface chemistry and localization of molecules within microfluid channels has opened many [...]

Characterization of an ultra high aspect ratio electron beam resist for nano-lithography

Lewis S., Jeanmaire D., Haynes V., Piccirillo L., The University of Manchester, UK

The performance of a new electron beam resist called SM20L-15 for use in electron beam lithography has been investigated. It was found that the clearing dose of this resist was 1025uC/cm2. The result is that [...]

Fabrication of Guided-mode Resonance Devices by Soft Lithography in Hybrimers

Lee K.J., Magnusson R., Jin J.H., Bae B.-S., University of Texas at Arlington, US

Diffractive optical elements and photonic crystals consist of fine spatial patterns designed to affect the spectrum, polarization, phase and other properties of light. Periodic layered structures are widely used in integrated optics, communication systems, spectroscopy, [...]

A Novel Self-Assembled and Maskless Technique for Highly Uniform Arrays of Nano-Holes And Nano-Pillars

Wu W., Dey D., Memis O.G., Katsnelson A., Mohseni H., Northwestern University, US

We present a low-cost and high-throughput process for realization of two-dimensional arrays of deep sub-wavelength features using a self-assembled monolayer of HCP silica and polystyrene microspheres and well-developed photoresist lithography. This method utilizes the microspheres [...]

Numerical Simulation of NIL Process Based on Continuum hypothesis

Kim S.M., Woo Y.S., Lee D.E., Lee W.I., Lee D.E., Lee W.I., Seoul Nat'l Univ., KR

Nano imprint lithography(NIL) is a cost-efficient, high-throughput processing technique to transfer nano-scale patterns onto thin polymer films. Polymers used as the resist include UV cured resins as well as thermoplastics such as polymethyl-methacrylate(PMMA). In this [...]

Lithographic fabricated ultra hydrophobic and porous plant-like surfaces for bio chip applications

Mertsch O., Walter A.D., Loechel B., Schondelmaier D., BESSY GmbH, DE

A novel method for fabricating ultra-hydrophobic surfaces for bio chip and MEMS applications is presented. The base of this method is a lithographic process with some substantial changes of the exposure conditions. Plant-like structures are [...]