A Novel Self-Assembled and Maskless Technique for Highly Uniform Arrays of Nano-Holes And Nano-Pillars

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We present a low-cost and high-throughput process for realization of two-dimensional arrays of deep sub-wavelength features using a self-assembled monolayer of HCP silica and polystyrene microspheres and well-developed photoresist lithography. This method utilizes the microspheres as super-lenses to fabricate highly uniform nano-holes and nano-pillars arrays over large areas on conventional positive and negative photoresists, and with a high aspect ratio. The period and diameter of the holes and pillars formed with this technique can be controlled precisely and independently. We also present our 3-D FDTD modeling, which shows a good agreement with the experimental results. The technique is simple, fast, economical, and is a convergence of bottom-up and top-down lithography.

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Journal: TechConnect Briefs
Volume: 1, Nanotechnology 2008: Materials, Fabrication, Particles, and Characterization – Technical Proceedings of the 2008 NSTI Nanotechnology Conference and Trade Show, Volume 1
Published: June 1, 2008
Pages: 574 - 577
Industry sector: Advanced Materials & Manufacturing
Topicss: Advanced Manufacturing, Nanoelectronics
ISBN: 978-1-4200-8503-7