Papers:
Automated Mask-Layout and Process Synthesis for MEMS
This paper presents a method for automated mask-layout and process synthesis for MEMS. The synthesis problem is approached by use of a genetic algorithm. For a given desired device shape, and several fabrication process choices, [...]
Creation of 3D Surface Models from 2D Layouts for BEM Anaylysis
In this paper we present a new approach to creation of 3D surface models of MEMS devices from 2D layout masks suitable for analysis using the Boundary Element Method (BEM) [1]. The algorithm is implemented [...]
Process Simulation for Contact Print Microlithography
Using a combination of experiment and simulations, we have studied the conformation of liquid microstructures on both at and corrugated, chemically heterogeneous substrates. The artificial surface patterns, which define regions of different surface energy, induce [...]
Full-chip Process Simulation for Silicon DRC
We have developed fast IC process simulation technique based on an empirical resist and etch models to compute the silicon image of designs as large as a full ULSI chip. The simulated silicon image is [...]
Systematic Design and Optimization of Multi-Material, Multi-Degree-of-Freedom Micro Actuators
The paper reports an automated method for the synthesis of multi-material, multi-degree-of-freedom micro actuators. The method is based on topology optimization, an iterative computational scheme consisting of alternating finite element analyses, sensitivity analyses and optimal [...]
Robust Ion-Implantation Process Design through Statistical Analysis
In this work, for the first time, we present a TCAD methodology to rigorously account for statistical variations due to these random process errors (inherent in all semiconductor processes), and thereby design a robust ion-implantation [...]
Two-Dimensional Simulation of Scanning Capacitance Microscopy Measurements of Arbitrary Doping Profiles
Accurate prediction of doping distributions in modern VLSI devices (e.g. shallow junctions) with TCAD tools represents a major challenge which requires the process simulation models to be accurately tuned on the basis of two-dimensional dopant [...]
Systematic Global Calibration of a Process Simulator
Lee J-H., Lee S-W., Kim K-D., Kim Y-W., Kong J-T., Lee J-H., Lee S-W., Kim K-D., Kim Y-W., Baek D-H., Samsung Electronics Co.Ltd., KR
This paper proposes a novel methodology of systematic global calibration of a process simulator and validates its accuracy and efficiency with application to memory and logic devices. With 175 SIMS profiles which cover the whole [...]
Modeling of the Self-Limiting Oxidation for Nanofabrication of Si
The self-limiting oxidation method has been frequently used to fabricate the nano-scale (e.g., sub-5 nm) Si columns and widely reported in the recent literature [1, 2]. However, few theoretical modeling has been carried out to [...]
On 2D/3D Numerical Oxidation Modeling: Calibration and Investigation of Silicon Crystal Orientation Effect on Stresses in Shallow Trench Isolations
Shallow trench isolations (STI) process needs careful optimization of thermal annealings in order to minimize leakage currents which may result from excessive mechanical stresses. Due to its intrinsic three-dimensional structure, conventional 2D process simulator is [...]
Simulation of Orientation-Dependent Etching of Silicon Using a New Step Flow Model of 3D Structuring
We present a new model of three-dimensional orientation-dependent etching of Si{100}. Recent experimental results suggest to conceive etching as a “peeling” process of terraced planes, leading to the concept of a “step flow model of [...]
Strength of Nanoscale Copper Connection Under Shear
Strength and shear modulus of several polycrystalline copper systems were calculated with the molecular dynamics method and effective-medium potential. Grain size varied between 2{10nm and systems were sheared beyond the yield point at room temperature. [...]
Modeling the Microstructure and Elastic Properties of Complex Materials
The finite element method is used to study the influence of porosity and pore shape on the elastic properties of model porous media. The Young's modulus of each model was found to be practically independent [...]
Pre-Physical Design Analysis and Optimization of Repeaters Based on Technology Node, Materials, Devices, and Repeater Options
For the first time a comprehensive methodology has been applied to the pre-physical design of hierarchical interconnect wiring with consideration of the limitations of both the device and the wiring technologies (Fig. 1). The overall [...]
Modeling of Focused Ion Beam Trimming of Cantilever Beams
A finite element model of the cantilever beam is implemented to include a non-uniform thickness along its length, due to focused ion beam trimming. A quasi-static, iterative approach is used to calculate the cantilever profile [...]
Self-Adapting Vertices for Mask-Layout Synthesis
An efficient procedure for synthesizing MEMS mask-layouts for a desired 3-D shape is discussed. This method can greatly reduce the number of design and prototype iterations required to produce a desired device. The method is [...]
Computer Simulation from Electron Beam Lithography to Optical Lithography
Simulation of electron beam lithography and optical lithography has been combined to investigate the influence of a distorted photomask feature on final photoresist image. Unlike the previous optical lithography simulation which was based on ideal [...]
Journal: TechConnect Briefs
Volume: Technical Proceedings of the 2000 International Conference on Modeling and Simulation of Microsystems
Published: March 27, 2000
Industry sector: Sensors, MEMS, Electronics
Topic: Modeling & Simulation of Microsystems
ISBN: 0-9666135-7-0