Papers – Page 16 – TechConnect Briefs

Real-Time Drift Correction of a Focused Ion Beam Milling System

Freeman D., Luther-Davies B., Madden S., Australian National University, AU

We are working towards the fabrication of large periodic optical structures known as photonic crystals. A focused ion beam (FIB) is used to mill holes, which must be smooth and repeatable, with nm positional accuracy. [...]

Carbon nanostructures grown with electron and ion beam methods

Lemoine P., Roy S.S., Maguire P.D., McLaughlin J.A.D., University of Ulster, UK

Simultaneous deposition and patterning of carbon nanostructures can be performed using focused electron beams or ion beams. Although a variety of useful tri-dimensional structures have been prepared (single electron transistor, nanotools, AFM probes, etc.), the [...]

Fabricating Nanoscale Features Using the 2-Step NERIME TSI Nanolithography Process

Gilmartin S.F., Arshak A., Arshak K., Collins D., Korostynska O., Arshak A., Arshak K., Analog Devices, IE

The 2-step negative resist image by dry etching (2-step NERIME) focused ion beam (FIB) top surface imaging (TSI) process is a novel nanolithography technique for creating nanometer scale resist features using conventional DNQ/novolak resists. The [...]

Femtosecond Inscription of the First Order Bragg Gratings in Pure Fused Silica

Dubov M., Mezentsev V., Bennion I., Aston University, UK

The fabrication of sub-micron periodic structures beyond diffraction limit is a major motivation for the present paper. We describe the fabrication of the periodic structure of 25 mm long with a pitch size of 260nm [...]

Nanogaps for fabrication of Molecular Devices

Kabir M.S., Enokson P., Chalmers University of Technology, SE

The development of different alternative technologies to fabricate various types of nanoscale devices based on non-conventional materials such as molecules and clusters are here reported. We had two different approaches to fabricate nangaps though there [...]

Fabrication of 3D carbon microelectrodes for Li-Ion battery applications

Turon Teixidor G., Wang C., Madou M.J., University of California Irvine, US

The fabrication of very high-aspect ratio 3D carbon microelectrodes for Li-Ion batteries is presented. Using a pyrolysis process under inert conditions, thick layers of patterned SU-8 photoresist (up to 700 ?m in height) are converted [...]

Use of Nanocrystalline Ceria in EUV Lithography Optics Polishing

Murray P.G., Böhm T., Maltor H., Nanophase Technologies Corporation, US

EUV lithography promises a huge gain in resolution due to the extremely short wavelength. The necessity of aspherical off-axis mirrors dramatically increased the challenge of manufacture compared to refractive designs. Due to the short wavelength [...]

Low cost PMMA based photo-masks for 3D grey scale micro-structuring applications

Lewis S., Wheeler-Jones R., Perks R., Haynes V., Cardiff university, UK

Grey scale lithography is a useful technique for the fabrication of three dimensional microstructures. Dose dependent positive resist materials are well suited to this application; subsequent dry etching through a suitably patterned etch mask can [...]

Rare Earth-Substituted BI 4Ti3O12 Nanocrystalline Thin Films: Synthesis and Ferroelectric Characterization

Tomar M.S., Katiyar R.S., Perales-Perez O., University of Puerto Rico, Mayaguez Campus, PR

In this work we present the synthesis of bare and rare earth (Ce,Er,Pr)-doped Bi4Ti3O12 (BIT) nanocystalline thin films using a method based on the Sol-Gel process. Thin films were deposited by spin coating on Pt [...]

Electrophotographic Direct-Write for Electronics

Wagner C., Patwardhan R., Jang B., Mahinfalah M., North Dakota State University, US

A new direct-write method based on electrophotography has been developed for use in electronics manufacture. In this research a test bed was created for proof of concept. This test bed was successfully used to print [...]