Sensors, MEMS, Electronics – Page 399

Modeling of Electrostatic MEMS Components

Lorenz G., Neul R., Dickmann S., Robert Bosch GmbH, DE

This paper describes an analytical approach for the network-type modeling of pull-in comb drives based on a mathematical field description using conformal mapping methods. The model was coded in MAST R for the SABER R [...]

System-Level Modeling

Design of Compensation Structures for Anisotropic Etching

Long M.K, Burdick J.W., Antonsson E.K., California Institute of Technology, US

Due to the highly anisotropic behavior of ilicon bulk etching,there have been many publications on etch simulation and convex corner compensation for specific geometries. Our previous work introduced a general framework for algorithmically synthesizing mask [...]

A Novel Method to Utilize Existing TCAD Tools to Build Accurate Geometry Required for MEMS Simulation

Wilson N.M., Liang S., Pinsky P.M., Dutton R.W., Stanford University, US

This paper details a technique that exploits domain decom-position and utilizes a combination of 1-D, 2-D, and 3-D process simulation to build physically accurate geometry of micro-electro-mechanical systems (MEMS) for simula-tion. The size and aspect [...]

Surface Reconstruction of Etched Contours

Lee C.-Y., Antonsson E.K., California Institute of Technology, US

Previously, a computationally efficient and geometrically accurate etching simulation was developed to compute con-tours of constant depth at different time steps [1]. Experi-mental verification of this early work has been established [2]. However, contours are [...]

Mask-Layout Synthesis Through an Evolutionary Algorithm

Li H., Antonsson E.K., California Institute of Technology, US

An automatic method for synthesizing MEMS mask-lay-outs is presented. This method uses evolutionary algorithm techniques to optimize the mask-layouts for a forward simu-lation of fabrication. Initially, a random population of mask-layouts is generated. The fabrication [...]

Nitrous Oxide-Based Progressive Silicon Oxynitridation in Furnaces of Different Dimensions

Dang S.S., Takoudis C.G., University of Illinois - Chicago, US

As integrated device technologies enter the deep sub-half micron regime, there is a need for a corresponding reduction in the thickness of the dielectrics too. After formation of the dielectric film, maintenance of its characteristics [...]

Laser Induced Surface Modification of Ceramic Substrates for Thermal and Electric Lines in Microsystems: Modeling Compared to Experiment

Gruhn H., Heidinger R., Rohde M., Rüdinger S., Schneider J., Zum Gahr K.-H., Forschungszentrum Karlsruhe, DE

Laser induced surface modification has been used to fabricate conducting paths in ceramic substrates. For the purpose of process simulation and prediction of process parameters a finite element model has been developed to simulate the [...]

Simulation Support for Silicon-Bulk Microsystems Demonstrated in an Inclination Sensor Development

Zielke D., GEMAC mbH, DE

The design and development are supported by many simulation tools nowadays. The specific use of technology modeling and FEM-simulation for silicon bulk micromachining is contents of the paper. For this, the whole procedure between the [...]

A Program for Modeling of Technological Routes of VLSI Fabrication – ProMIC-T

Tesluk V., Korbetskyy O., Lvov Polytechnic, UA

A technological process of the VLSI fabrication constantly improves. In such conditions, new technology and constructive problems appear when making IC with submicron sizes. Decision for these problems is possible only by using CAD tools, [...]