Mask-Layout Synthesis Through an Evolutionary Algorithm


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An automatic method for synthesizing MEMS mask-lay-outs is presented. This method uses evolutionary algorithm techniques to optimize the mask-layouts for a forward simu-lation of fabrication. Initially, a random population of mask-layouts is generated. The fabrication of each layout is sim-ulated through a digital process simulator to produce a 3D fabricated shape, which is compared to a user-specified desired shape. Each evolutionary loop governs the stochastic searching behavior such that the mask-layouts whose simu-lated shapes are closer to the desired shape are more likely to survive. More importantly, the ìbetterî masks are more likely to be evolved among those survived mask-layouts for the next loop. Through such evolutionary iterations, a near global ìoptimumî mask-layout is likely to be found. A test loop is constructed for the bulk wet etching mask synthesis by incorporating a 3D wet etching simulator. The current emerging results demonstrate the feasibility of this approach to mask-layout synthesis.

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Journal: TechConnect Briefs
Volume: Technical Proceedings of the 1999 International Conference on Modeling and Simulation of Microsystems
Published: April 19, 1999
Pages: 113 - 116
Industry sector: Sensors, MEMS, Electronics
Topic: Modeling & Simulation of Microsystems
ISBN: 0-9666135-4-6