nanoimprint – TechConnect Briefs

Tunable-Linewidth Nanoimprint Working Stamps Fabricated by Double Oblique Metal Deposition

Lin C.H., Wu C-L, Sung C.K., National Tsing Hua University, TW

This paper proposes a low cost but rapid methodology for fabricating working stamps with tunable line-width or pitch structures. Conventionally, the master stamp for nanoimprint lithograph (NIL) is made of silicon by e-beam lithography, which [...]

An Improved Micro Injection Molding Technique for Grating Devices

Li H.S., Liu K.C., Hsieh W.H., Au L.K.C., Liu K.C., National Chung Cheng University, TW

There is a new method about grating fabrication in our submission abstract. This method can help us to fabricate micro or nano devices more easily and inexpensively. I think it is very suitable for this [...]

Functional Polymer Micro- and Nanostructures by Nanoimprint

Cheng X., Park H., Cui D., Texas A&M University, College Station, US

We present here the patterning of polymer micro- and nanostructures by nanoimprint technique. Since its inception, nanoimprint has gained huge interest as a high-resolution and low-cost lithography technique for microelectronic fabrication. We demonstrate that nanoimprint [...]

Nanostructuration of sol-gel thin films

Peroz C., Goletto V., Foresti M., Heitz C., Le Gratiet L., Barthel E., Sondergard E., Laboratoire mixte CNRS/Saint-Gobain, FR

Sol-gel chemistry is very versatile and structuring sol-gel materials will allow a fine tuning of chemistry, electromagnetic, optical and mechanical properties. We explore the possibilities to combine sol-gel chemistry to large scale patterning at low [...]

Nanoimprint Mold Manufacturing with Focused Ion Beam

Chung M., Huang B.R., Weng M.H., Fu C.S., Chang Y.Y., Lai S.W., Chiou J.M., Chen Y-C, Tzeng Y.H., Southern Taiwan University of Technology, TW

Nanoimprint lithography (NIL) is an emerging low cost technique for reproducing sub-100 nm pattern in various applications; however, manufacturing the mold for nanoimprint has been a key issue both in expense and resolution. Focused Ion [...]

Resolution Enhancement in Nanoimprinting by Surface Energy Engineering

Jung G.Y., Wu W., Li Z., Wang S.Y., Tong W.M., Williams R.S., Hewlett Packard Laboratories, US

Nanoimprinting lithography was initiated as an alternative way to achieve nanoscale structures with high throughput and low cost. We have developed a UV-nanoimprint process to fabricate 34 by 34 crossbar circuits with a half-pitch of [...]

NILCom® – Commercialization of Nanoimprint Lithography

Luesebrink H., Glinsner T., Moormann Ch., Bender M., Fuchs A., EV Group, AT

NILCom is a consortium and technology platform for Nanoimprint Lithography (NIL) processes. NILCom offers the opportunity to leverage NIL synergies and support market segment acceleration for processes and infrastructure in its main areas of interest: [...]

Numerical Analysis of Nano-imprinting Process Based on Continuum Hypothesis

Kim B.S., Kim H-C, Woo Y.S., Lee W.I., Oh S.I., Kim B.S., Kim H-C, School of Mechanical and Aerospace Engineering, Seoul National University., KR

Nano-imprint lithography (NIL) is a processing tech-nique capable of transferring nano-scale patterns onto a thin film of thermoplastics such as polymethyl methacrylate (PMMA). Feature sizes down to 10 nm have been demonstrated to be made [...]