Papers – Page 75 – TechConnect Briefs

PECVD synthesis of Si nano-wires

Kravcheko I.I., University of Florida, US

Silicon nano-wires 42 nm in diameter and up to 70 micrometer long have been obtained by utilizing a common for an average nano-fabrication facility plasma equipment set that did not require special modifications.

Vapor Deposited Nanolaminates

Kobrin B., Grimes M., Dangaria N., Applied Microstructures, Inc., US

We present the latest developments in nanocoatings deposition technology, realized using Molecular Vapor Deposition (MVD®) method. Multi-layer nanolaminates of metal oxides (alumina, titania, silicon oxide, …etc.) and self-assembled monolayers (SAMs) sequentially deposited using an automated [...]

Identification of Endohedral Metallofullerenes by Method of UV-VIS Spectroscopy

Dobrovolsky V.D., Anikina N.S., Krivuschenko O.Ya., Chuprov S.S., Mil’to O.V., Zolotarenko A.D., Institute for Problems of Materials Science of NAS of Ukraine, UA

As the class of new synthesized compounds endofullerenes attract a close attention of theorists and practicians and especially after appearance of possibility to produce them in macroscopic amounts. This has allowed the investigation of their [...]

Large scale synthesis of SiC nanofibers from various carbon precursors

Ritts A.C., Li H., Yu Q., University of Missouri-Columbia, US

In this proceeding submicron and micron sized graphitic particles were compared with MWNTs as precursors for producing several grams of SiC nanofibers in a 3’’ diameter hot-walled chemical vapor deposition reactor. Nickel nitrate and the [...]

INGAAS/GAAS Quantum Dot With Material Mixing

Filikhin I., Suslov V.M., Vlahovic B., North Carolina Central University, US

We model an InGaAs/GaAs quantum dot having dependence of the Ga fraction along vertical axis. The effect of material mixing on the electron energy spectra is considered. This theoretical model is based on a single [...]

Vertically aligned carbon nanowires (CNWs): Top-down approach using photolithography and pyrolysis

Lee J.A., Lee S-W., Lee S.S., Lee J.A., Lee S-W., Lee S.S., Lee J.A., Lee S-W., Lee S.S., Korea Advanced Institute of Science and Technology (KAIST), KR

Top-down approach for vertically aligned CNWs has not reported yet although it is necessary for immediate integration of CNWs with micro and nano systems. In this paper, vertically aligned pyrolyzed carbon nanowires (CNWs) is fabricated [...]

Silylation Hardening for Mesoporous Silica Zeolite Film

Kikkawa T., Hiroshima University, JP

Pure silica zeolite films were prepared for ultra-low-k interlayer dielectrics in ultra-large integrated circuits by both hydrothermal crystallization using tertabuthylammonium hydroxide, tetraethylorthosilicate and ethylalcohol, and vapor phase transport synthesis using ethylene diamine and triethylamine. Self-assembled [...]

Fabrication & Integration of nanobolometer sensors on a MEMs process

Gilmartin S.F., Arshak A., Arshak K., Collins D., Bain D., Lane W.A., Korostynska O., Arshak A., Arshak K., McCarthy B., Newcomb S.B., Analog Devices, IE

In this paper, we report the fabrication of novel nanoscale bolometer sensor devices using conventional titanium and titanium-nitride metal films, with total bolometer film thicknesses ranging from 60-150nm. The bolometer devices we present are integrated [...]

Nanomaching of Silicon nanoporous Structures by Colloidal Gold Nanoparticle

Zhu J., Bart-Smith H., Begley M.R., Kelly R.G., Zangari G., Reed M.L., University of Virginia, US

We report an efficient method for fabricating nanoporous structures in crystalline silicon, using colloidal gold nanoparticles in HF/H2O2 etchant. Colloidal gold in HF/H2O2 solutions accelerates the etching rate by two orders of magnitude and simultaneously [...]

Periodic Nanowell Array using Template-Assisted Nanosphere Lithography

Jung S., Lee J., Seoul National University, KR

This paper presents a template-assisted nanosphere lithography(NSL) to obtain high-quality crystal in regularity and coverage(Figure 1). A periodic array of 100-nm deep, 360-450 nm wide nano-trenches was fabricated by nano imprint lithography(NIL), and used as [...]