Vapor Deposited Nanolaminates

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We present the latest developments in nanocoatings deposition technology, realized using Molecular Vapor Deposition (MVD®) method. Multi-layer nanolaminates of metal oxides (alumina, titania, silicon oxide, …etc.) and self-assembled monolayers (SAMs) sequentially deposited using an automated system in-situ without breaking a vacuum between layers show improved lifetime and environmental stability (mechanical impact, immersion in liquids, …etc.) compared to just SAM layer alone. Using surface reaction driven processes for metal oxides and self-assembling techniques for organic coatings assures high conformality of the resultant deposited nanolaminates. Low temperature processing allows this technology to be applied to temperature sensitive materials and devices (plastics, magnetic devices,…etc.) Examples of successful applications of multi-layer MVD technology in nanoimprint lithography, inkjet printing, and moisture protection are discussed.

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Journal: TechConnect Briefs
Volume: 1, Nanotechnology 2008: Materials, Fabrication, Particles, and Characterization – Technical Proceedings of the 2008 NSTI Nanotechnology Conference and Trade Show, Volume 1
Published: June 1, 2008
Pages: 619 - 622
Industry sector: Advanced Materials & Manufacturing
Topicss: Advanced Manufacturing, Nanoelectronics
ISBN: 978-1-4200-8503-7