Papers – Page 14 – TechConnect Briefs

Oriented Molecular Sieve Films by Heteroepitaxial Growth

Jeong H-K, Krohn J., Sujaoti K., Tsapatsis M., Univ. of Massachussetts at Amherst, US

Potential uses of crystalline molecular sieves as selective membranes, membrane reactors, chemical sensors, optical devices as well as in other new applications rely on the ability to grow them as films.1-12 The crystallinity of these [...]

Fabrication of 20 nm Embedded Longitudinal Nanochannels Transferred from Metal Nanowire Patterns

Choi D.S., Yang E.H., Jet Propulsion Laboratory, US

The traditional electron beam lithography and more recently developed focused ion beam (FIB) milling/lithography techniques have been exploited for generating exposed nanometer-size nanochannels. An additional process step of sealing exposed nanochannels cant be avoided to [...]

Near-Field Nanomodification of Thin Films Using Femtosecond Laser and Atomic Force Microscope

Chimmalgi A., Choi T.Y., Grigoropoulos C.P., Wan D., Komvopoulos K., University of California-Berkeley, US

Nanostructures, which have characteristic dimensions that are difficult to achieve by conventional optical lithography techniques, are finding ever-increasing applications in a variety of fields. For applications incorporating nanodevices to gain widespread acceptance, high resolution, reliability [...]

AFM Anodization Studied by Spectromicroscopy

Lazzarino M., Mori G., Ercolani D., Ressel B., Colli A., Sorba L., Locatelli A., Cherifi S., Ballestrazzi A., Heun S., Laboratorio TASC INFM, IT

The fabrication of state-of-the-art semiconductor nanostructures is of great interest both for fundamental physics and device applications. Besides the traditional lithography techniques, local anodic oxidation by atomic force microscopy (AFM) is emerging because of its [...]

Step and Flash Imprint Lithography Using UV-transparent, Electrically Conductive Templates

Hooper A., Talin A.A., Dauksher W.J., Baker J.H., Convey D., Eschriech T., Resnick D.J., Bailey T.C., Johnson S., Willson C.G., Motorola Labs, US

Step and flash imprint lithography (SFIL) is a promising new technique capable of resolving sub 100nm features at a substantially lower cost than any other candidate method currently under development. Successful implementation of SFIL requires [...]

Effects of Electric Field on the Growth of One-dimensional Carbon Materials in the Chemical Vapor Deposition Process

Tai N-H, Lee C.-Y., Chiu I-C, Lin I-N, National Tsing Hua University, TW

Effects of Electric Field on the Growth of One-dimensional Carbon Materials in the Chemical Vapor Deposition Process (PCVD) Nyan-Hwa Tai* a), Chi-Young Lee b), I-Chang Chiu a), and I-Nan Lin b) a)Department of Materials Science [...]

Self-assembly of Deinococcus Radiodurans S-layer Proteins

Lin J., Tan T.S.T., National Tsing Hua Univ., TW

Proteins capable of self-assembly are crucial to many bio-architectures and have potential applications in nanotechnology. An example is the group of proteins used to construct crystalline surface layers (S-layers) in nearly all archaebacteria and many [...]

Modeling and Simulation for Epitaxial Growth with Strain

Caflisch R.E., Connell C., Luo E., Gyure M., Simms G., Vvedensky D., UCLA, US

We describe a new approach to simulation of epitaxial growth with strain. An island dynamics model with a level set numerical method is used for the growth, a lattice statics model is used for the [...]

Synthesis and Application of Nanofabricated Nanoporous Materials

Park S-E, Hwang J.S., Hwang Y.K., Jhung S.H., Chang J-S, Hwang J.S., Hwang Y.K., Kim D.S., Korea Research Institute of Chemical Technology, KR

Zeolitic (molecular sieves) or mesoporous materials are the promising candidates for nanoscopically-engineered materials due to their well-defined pore structures, thermal stabilities and tailor-made synthetic abilities. Several zeolitic materials with the shape of nanorod or nanofiber [...]

Low K Carbon Films Deposited in Low Frequency Discharge for Sub-micron Devices

Kosarev A., Torres A., Zuniga C., Institut National for Astrophysics, Optics and Electronics, MX

An interconnect delay begins to dominate total device delay time and consequently, operation rate at sub-micron (