Low K Carbon Films Deposited in Low Frequency Discharge for Sub-micron Devices

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An interconnect delay begins to dominate total device delay time and consequently, operation rate at sub-micron (

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Journal: TechConnect Briefs
Volume: 3, Technical Proceedings of the 2003 Nanotechnology Conference and Trade Show, Volume 3
Published: February 23, 2003
Pages: 29 - 32
Industry sector: Personal & Home Care, Food & Agriculture
Topic: Personal & Home Care, Food & Agriculture
ISBN: 0-9728422-2-5