Choi D.S. – TechConnect Briefs

Sub-100nm and Large Area Pattern Process using by Hybrid Nanocontact Printing (HnCP)

Jo J., Kim K-Y, Choi D.S., Lee E-S, Korea Institute of Machinery & Materials(KIMM), KR

The hybrid nanocontact printing(HnCP) method is a technology for manufacturing an ultra violet(UV) imprinted silicon substrate from a master and then printing by letting it get in contact with a substrate coated with a metal [...]

Fabrication of 20 nm Embedded Longitudinal Nanochannels Transferred from Metal Nanowire Patterns

Choi D.S., Yang E.H., Jet Propulsion Laboratory, US

The traditional electron beam lithography and more recently developed focused ion beam (FIB) milling/lithography techniques have been exploited for generating exposed nanometer-size nanochannels. An additional process step of sealing exposed nanochannels cant be avoided to [...]