Comparative Analysis of Threshold Voltage Variations in Presence of Random Channel Dopants and a Single Random Interface Trap for 45 nm N-MOSFET as Predicted by Ensemble Monte Carlo Simulation and Existing Analytical Model Expressions

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Comparative analysis of analytical model and full Ensemble Monte Carlo simulation which takes into account both the short-range and the long-range coulomb interaction in the presence of random dopants and random traps is performed.

Characteristics of co-doped device with hole and electron transport material

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We demonstrated green organic lighte-emittin diodes (OLEDs) improved by co-doped using hole transport material, N′-bis-(1-naphyl)-N,N′-diphenyl-1,1′-biphenyl-4,4′-diamine (NPB) and electron transport material, bis(2-methyl-8-quninolinato)-4-phenylphenolate aluminum (Balq), into emitting layer. The co-doped materials impove charge blance by injecting hole [...]