lithography – Page 2 – TechConnect Briefs

Novel lithography technique using an ASML stepper/scanner for the manufacture of display devices in MEMS world

Best K., Raval P., Kappel N., Yang C., Wang M., Jeewakhan N., Prejda M., Kassekert K., Moore M., ASML USA, Inc - Special Applications, US

In the MEMS and MOEMS product world, manufacturer of display/micro-devices requires bonding of two wafers. The front side pattern of the top wafer needs to be aligned with aggressive overlay requirement with the remaining portion [...]

High-density Optical Disk Mastering Using Electron Beam Lithography with Modified LIGA Demolding Mechanism

Chao C.H., Pan C.T., National Sun Yat-Sen University, TW

In the study, a spiral nano-groove with 110nm in linewidth and 80nm in depth has been successfully fabricated. This method, Optical disk mastering using electron beam lithography, could provide about 50Gbytes storage capacity and is [...]

Step and Flash Imprint Lithography Using UV-transparent, Electrically Conductive Templates

Hooper A., Talin A.A., Dauksher W.J., Baker J.H., Convey D., Eschriech T., Resnick D.J., Bailey T.C., Johnson S., Willson C.G., Motorola Labs, US

Step and flash imprint lithography (SFIL) is a promising new technique capable of resolving sub 100nm features at a substantially lower cost than any other candidate method currently under development. Successful implementation of SFIL requires [...]

Atomic-control Placement of Individual P atoms in Si for the Fabrication of a Quantum Computer Qubit Array

Schofield S.R., Curson N.J., Simmons M.Y., Hallam T., Ruess F.J., Oberbeck L., Clark R.G., University of New South Wales, AU

The ability to control the location of individual dopant atoms within a semiconductor has enormous potential for the creation of atomic-scale electronic devices. One of the most ambitious proposals for such a device is the [...]

Computer Simulation from Electron Beam Lithography to Optical Lithography

Cui Z., Rutherford Appleton Laboratory, UK

Simulation of electron beam lithography and optical lithography has been combined to investigate the influence of a distorted photomask feature on final photoresist image. Unlike the previous optical lithography simulation which was based on ideal [...]

Full-chip Process Simulation for Silicon DRC

Sahouria E., Granik Y., Cobb N., Toublan O., Mentor Graphics Corporation, US

We have developed fast IC process simulation technique based on an empirical resist and etch models to compute the silicon image of designs as large as a full ULSI chip. The simulated silicon image is [...]

Simulating 3-Dimensional Deep X-ray Lithography Using the CXrL Toolset

Aigeldinger G., Craft B., Menz W., Louisiana State University, US

Experimental evaluation of the dose distribution resulting from 3-dimensional deep x-ray lithography is often impractical. Computer modeling is a valuable tool for simulating this system. Preliminary simulations of 3-dimensional, deep, xray lithography exposures have been [...]

A Semi-Empirical Resist Dissolution Model for Sub-micron Lithographies

Khan M., Bollepalli S.B., Cerrina F., UW-Madison, US

In this paper, we present a new resist dissolution model suitable for large range of application domains - from memory devices employing < 130nm design rules to MEMS devices with design rules exceeding 10s of [...]