FIB – Page 2 – TechConnect Briefs

High resolution Nanolithography using Focused Ion Beam Scanning Electron Microscopy (FIB SEM)

Wilhelmi O., Roussel L, Stokes D.J., Hubert D.H.W., FEI Company, NL

State-of-the-art FIB technology combined with high-performance SEM is making a big impact on nanotechnology, particularly with the ability to use either focused ions or electrons to perform advanced nanolithography. Achieving the highest standards requires an [...]

An Introduction to Helium Ion Microscopy and its Nanotechnology Applications

Notte J.A., Farkas L., Hill R., Ward B., ALIS Corporation, US

A new imaging technology based on a scanning helium ion beam has been realized. This technology has several advantages over the traditional SEM. Due to the very high source brightness, and the shorter wavelength of [...]

Aspect Ratio Improvement using the 2-step NERIME FIB Top Surface Imaging Process for Nano-lithography Applications

Arshak A., Arshak K., Gilmartin S.F., Collins D., Korostynska O., Arshak A., Arshak K., University of Limerick and Analog Devices, IE

The 2-step NERIME FIB top surface imaging process uses Ga+ ion implantation into resist followed by O2 plasma dry development using reactive ion etching. Previous work has demonstrated this process using 1.5um thick films of [...]

Optimization of Nano-Machining with Focused IonBeams

Giannuzzi L.A., Anzalone P., Phifer D., FEI Company, US

It is shown that by optimizing ion-solidinteractions, nano-lines of different aspect ratios can be machined into samples using focused ionbeams.

SOI Processing of a Ring Electrokinetic Chaotic Micromixer

Zhang Y.T., Chen H., Mezic I., Meinhart C.D., Petzold L., MacDonald N.C., university of california, santa barbara, US

Micromixing has been an active research area in the past decade due to the rapid expanding application of the lab-on-a-chip system in life science. Using the silicon bulk micromachining technology, a ring electroosmotic micromixer, which [...]

Fabrication of 20 nm Embedded Longitudinal Nanochannels Transferred from Metal Nanowire Patterns

Choi D.S., Yang E.H., Jet Propulsion Laboratory, US

The traditional electron beam lithography and more recently developed focused ion beam (FIB) milling/lithography techniques have been exploited for generating exposed nanometer-size nanochannels. An additional process step of sealing exposed nanochannels cant be avoided to [...]