State-of-the-art FIB technology combined with high-performance SEM is making a big impact on nanotechnology, particularly with the ability to use either focused ions or electrons to perform advanced nanolithography. Achieving the highest standards requires an understanding of the physics and chemistry of the system as a whole, which contains ions and electrons of various energies and origins, substrates with a range of electrical and mechanical properties and reactive gases capable of specific effects on sputtering and re-deposition. We have built up a detailed knowledge of these complex parameters and, accordingly, have developed new strategies, allowing us to generate high resolution nanolithographic structures down to a few nanometers. We will compare and contrast different strategies in order to demonstrate the importance of factors such as single- or multi-pass execution, selection of pitch, choice of beam and time-dependent considerations, amongst others.
Journal: TechConnect Briefs
Volume: 1, Technical Proceedings of the 2007 NSTI Nanotechnology Conference and Trade Show, Volume 1
Published: May 20, 2007
Pages: 250 - 253
Industry sector: Advanced Materials & Manufacturing
Topicss: Advanced Manufacturing, Nanoelectronics