Papers:
A Program for Modeling of Technological Routes of VLSI Fabrication – ProMIC-T
A technological process of the VLSI fabrication constantly improves. In such conditions, new technology and constructive problems appear when making IC with submicron sizes. Decision for these problems is possible only by using CAD tools, [...]
Laser Induced Surface Modification of Ceramic Substrates for Thermal and Electric Lines in Microsystems: Modeling Compared to Experiment
Gruhn H., Heidinger R., Rohde M., Rüdinger S., Schneider J., Zum Gahr K.-H., Forschungszentrum Karlsruhe, DE
Laser induced surface modification has been used to fabricate conducting paths in ceramic substrates. For the purpose of process simulation and prediction of process parameters a finite element model has been developed to simulate the [...]
Nitrous Oxide-Based Progressive Silicon Oxynitridation in Furnaces of Different Dimensions
As integrated device technologies enter the deep sub-half micron regime, there is a need for a corresponding reduction in the thickness of the dielectrics too. After formation of the dielectric film, maintenance of its characteristics [...]
Mask-Layout Synthesis Through an Evolutionary Algorithm
An automatic method for synthesizing MEMS mask-lay-outs is presented. This method uses evolutionary algorithm techniques to optimize the mask-layouts for a forward simu-lation of fabrication. Initially, a random population of mask-layouts is generated. The fabrication [...]
Surface Reconstruction of Etched Contours
Previously, a computationally efficient and geometrically accurate etching simulation was developed to compute con-tours of constant depth at different time steps [1]. Experi-mental verification of this early work has been established [2]. However, contours are [...]
A Novel Method to Utilize Existing TCAD Tools to Build Accurate Geometry Required for MEMS Simulation
This paper details a technique that exploits domain decom-position and utilizes a combination of 1-D, 2-D, and 3-D process simulation to build physically accurate geometry of micro-electro-mechanical systems (MEMS) for simula-tion. The size and aspect [...]
Design of Compensation Structures for Anisotropic Etching
Due to the highly anisotropic behavior of ilicon bulk etching,there have been many publications on etch simulation and convex corner compensation for specific geometries. Our previous work introduced a general framework for algorithmically synthesizing mask [...]
Journal: TechConnect Briefs
Volume: Technical Proceedings of the 1999 International Conference on Modeling and Simulation of Microsystems
Published: April 19, 1999
Industry sector: Sensors, MEMS, Electronics
Topic: Modeling & Simulation of Microsystems
ISBN: 0-9666135-4-6