Papers:
Novel lithography technique using an ASML stepper/scanner for the manufacture of display devices in MEMS world
Best K., Raval P., Kappel N., Yang C., Wang M., Jeewakhan N., Prejda M., Kassekert K., Moore M., ASML USA, Inc - Special Applications, US
In the MEMS and MOEMS product world, manufacturer of display/micro-devices requires bonding of two wafers. The front side pattern of the top wafer needs to be aligned with aggressive overlay requirement with the remaining portion [...]
High resolution Nanolithography using Focused Ion Beam Scanning Electron Microscopy (FIB SEM)
State-of-the-art FIB technology combined with high-performance SEM is making a big impact on nanotechnology, particularly with the ability to use either focused ions or electrons to perform advanced nanolithography. Achieving the highest standards requires an [...]
Dip Pen Nanolithography®: A Maturing Technology for High-Throughput Flexible Nanopatterning
Precision nanoscale deposition is a fundamental requirement for much of current nanoscience research. Further, depositing a wide range of materials as nanoscale features onto diverse surfaces is a challenging requirement for nanoscale processing systems. As [...]
Fabrication of Bowtie Nano-Gap Structures by Electron Beam Lithography
Metallic nano-particle pairs in close proximity to one another display surface-enhanced raman scattering (SERS). Single-molecule detection has been predicted to be possible thanks to SERS. The SERS enhancement is due an induced localized electric field [...]
Gas Phase Nanoparticle Integration
We report on two gas phase nanoparticle integration processes to assemble nanoparticles and other nanomaterials onto desired areas on a substrate. We expect these processes to work with any material that can be charged including [...]
Silicon Nanowire Transistors Fabricated by the Mass-Manufacturable, Self-Assembling “Grow-in-Place” Approach
Silicon nanowire (SiNW) transistor fabrication, until our work, has had environmental concerns and manufacturing issues arising from the use of a complex process flow involving SiNW growth and harvesting followed by nanowire positioning, aligning and [...]
Electric Field Process for the Fabrication of Higher Order Structures form Biomolecule Derivatized Nanoparticles
An electronic microarray has been used to carry out directed self-assembly of higher order 3D structures from Biotin/Streptavidin and DNA derivatized nanoparticles. Structures with up to fifty layers of alternating biotin and streptavidin and DNA [...]
Nanofabrication of Biomaterial, CNT and Organic Polymer Patterned Thinfilms using Piezoelectric Ink Jet Printing
In contrast to thermal ink jetting that uses heat to generate fluid drop ejection, MEMS-constructed piezoelectric ink jet printheads use a thin PZT slab bonded to a silicon diaphragm to generate acoustic energy that drives [...]
Direct Parallel Patterning of Multiplex DNA and protein arrays
Multiplex DNA and protein arrays can be routinely generated on glass or metal-coated substrates via Dip-Pen Nanolithography (DPN) using new commercially available DPN accessories like multiple pen arrays and inkwells.
Thickness-controlled Metal Nanoscale Etch for Proposed Metal Nanowires Fabrication
In this works, we developed a novel nanoscale etch process of metallic structures, the metal peel-off method(MPOM), to realize proposed fabrication of metal nanowires. Using this method, we simply and uniformly self-controlled etching rate of [...]
Journal: TechConnect Briefs
Volume: 1, Technical Proceedings of the 2007 NSTI Nanotechnology Conference and Trade Show, Volume 1
Published: May 20, 2007
Industry sector: Advanced Materials & Manufacturing
Topics: Advanced Manufacturing, Nanoelectronics
ISBN: 1-4200-6182-8