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Home2010June

Month: June 2010

TechConnect Proceedings Papers

Photonic Curing of Silver Nanoparticle Based Inks Deposited by M3D

West J., Carter M., Smith S., Sears J., South Dakota School of Mines and Technology, US
Photonic curing is uniquely suited to rapidly sinter printed films in an assembly line or roller environment. Previous work has focused on measuring the resistivity of films sintered using photonic curing and comparing those results [...]

Preparation of nanopatterned substrates via Dip-pen Nanolithography for stem cell applications

Oberhansl S., Lagunas A., Martinez E., Jamil H., Samitier J., Institute for Bioengineering of Catalonia, ES
Dip-pen Nanolithography is used to fabricate nanopatterned substrates for stem cell experiments. Factors which are known to play a role in stem cell differentiation are immobilized on these substrates. The highly controlled order, in which [...]

Measurement of Figure of Merit for a Single β-Silicon Carbide Nanowire by the Four-Point Three-ω Method

Choi T.Y., Univ. of North Texas, US
The thermoelectric figure of merit (ZT) of a single β-Silicon Carbide (SiC) nanowire (NW) was measured using the four-point three-omega (3-ω) method for the first time. The electrical conductivity (σ), thermal conductivity (κ), and Seebeck [...]

Nanoscale Graphene Lithography Using an Atomic Force Microscope

Kumar K., Yang E.H., Stevens Institute of Technology, US
In this work, we study Atomic Force Microscope local oxidation lithography to precisely fabricate nanometer-scale structures from graphene, a recently discovered material with exceptional electrical properties. We have systematically studied oxidation parameters (electric field, humidity, [...]

Characterization of an ultra high aspect ratio electron beam resist for nano-lithography

Lewis S., Jeanmaire D., Haynes V., Piccirillo L., The University of Manchester, UK
The performance of a new electron beam resist called SM20L-15 for use in electron beam lithography has been investigated. It was found that the clearing dose of this resist was 1025uC/cm2. The result is that [...]

PRINT® Nanoparticle Manufacturing Scaleup for Pharmaceutical Applications

Schorzman D.A., Liquidia Technologies, Inc., US
Nanotechnology research is still in its infancy, and while nanotechnology is widely seen as having huge potential, the pharmaceutical industry remains skeptical that success at the bench scale can successfully be translated into high volume [...]

Hierarchically Branched Gecko Tapes Imprinted Using Porous Alumina Templates

Yee A.H.Y., Lam Y.C., Institute of Materials Research and Engineering, SG
In this work, we show the methodology to fabricate hierarchical nano-structures of various geometrical parameters to mimic closely gecko’s adhesion system. The relevant geometrical parameters investigated are a) the aspect ratio of the fibrils b) [...]

Networking in Micro/Nano Reliability Research Encouraged by EUCEMAN, the European Center for Micro- and Nanoreliability

Michel B., Hammacher J., Winkler T., Kaulfersch E., Fraunhofer ENAS, DE
Based on the conviction that advanced micro and nanotechnologies are continuing to have an ever stronger influence in all spheres of human life and will permeate them even more fully in the future, without, conversely, [...]

Advanced In- and Out-off plane High Resolution X-ray Strain Analysis on MEMS

Neels A., Dommann A., CSEM, CH
Related to the dramatically smaller volume of microelectromecanical systems (MEMS), new methods in testing and qualification are needed. In single crystal silicon (SCSi) based devices, stress and loading in operation introduces defects during the MEMS [...]

Influence of moisture on humidity sensitive material parameters of microelectonic relevant polymers

Walter H., Dermitzaki E., Wunderle B., Michel B., Fraunhofer IZM, DE
This paper presents various modified measurement methods for analysis the effect of moisture of thermo-mechanical properties of MEMS relevant polymer systems. It was developed an advanced measurement method, modified DMA multifrequency and hygroscopic swell analysis, [...]

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