Nanoelectronics – Page 28 – TechConnect Briefs

Nanoscale Graphene Lithography Using an Atomic Force Microscope

Kumar K., Yang E.H., Stevens Institute of Technology, US

In this work, we study Atomic Force Microscope local oxidation lithography to precisely fabricate nanometer-scale structures from graphene, a recently discovered material with exceptional electrical properties. We have systematically studied oxidation parameters (electric field, humidity, [...]

Characterization of an ultra high aspect ratio electron beam resist for nano-lithography

Lewis S., Jeanmaire D., Haynes V., Piccirillo L., The University of Manchester, UK

The performance of a new electron beam resist called SM20L-15 for use in electron beam lithography has been investigated. It was found that the clearing dose of this resist was 1025uC/cm2. The result is that [...]

PRINT® Nanoparticle Manufacturing Scaleup for Pharmaceutical Applications

Schorzman D.A., Liquidia Technologies, Inc., US

Nanotechnology research is still in its infancy, and while nanotechnology is widely seen as having huge potential, the pharmaceutical industry remains skeptical that success at the bench scale can successfully be translated into high volume [...]

Hierarchically Branched Gecko Tapes Imprinted Using Porous Alumina Templates

Yee A.H.Y., Lam Y.C., Institute of Materials Research and Engineering, SG

In this work, we show the methodology to fabricate hierarchical nano-structures of various geometrical parameters to mimic closely gecko’s adhesion system. The relevant geometrical parameters investigated are a) the aspect ratio of the fibrils b) [...]

NanoFab: Manufacture, Instrumentation

The Effects of Gamma rays on P-channel MOSFET

Iqbal M.A., Firdous U., Punjab University, PK

The effect of Gamma rays on PMOS is studied. The range of Gamma rays used from 1M.rad to 3M.rad. The device is exposed by gamma radiation and observes its parameters as threshold voltage, trans-conductance and [...]

A Fan-in Bounded Low Delay Adder for Nanotechnology

Sun Y., Wagh M.D., Lehigh University, US

This paper presents an adder designed specifically for nanoelectronics. It exploits the basic characteristics of nanoelectronic technologies such as the RTD, SET and QCA to provide an adder that has a very low delay and [...]

A New QCA Architecture for the Future of Nano-Scale Computing

Hook IV L.R., Lee S-C, University of Oklahoma, US

By the time CMOS reaches its physical scaling limits in the next several years, computing will have very likely evolved to meet the demands imposed with increases in application complexity and the processing of enormous [...]

An Architecture for Designing Noise-Tolerant QCA Nanocircuits

Lee S-C, Hook IV L.R., University of Oklahoma, US

Due to many random factors from thermal fluctuations to wave interference, computation perfection in nanoICs is hard to achieve. Defects and faults arise from noise susceptibility of nanoICs which leads to unreliable results. A probabilistic [...]

Semiconductor nanoparticles in Photocatalysis: The Emerging Art and Perspectives

Sharma A., Sharma R., Sharma A., Sharma R., Sharma A., Sharma R., AKG College of Engineering, UPTU, IN

A principle of semiconductor nanophotocatalysis – a new trend in photochemistry deals with the photocatalytic redox-reactions with the participation of semiconductor nanoparticles. The origin of various size-dependent explanations in the semiconductor photocatalysis are spot light [...]