Advanced Materials & Manufacturing – Page 54

Inkjet Printing of High κ-Dielectric Ceramic/Polymer Composite Thick Films

Mikolajek M., Binder J.R., Karlsruhe Institute of Technology (KIT), DE

Inkjet printing offers a high flexibility and therefore is increasingly gaining importance for the selective deposition of functional materials, for example in printed electronics. However, till today either particle based inks or inks based on [...]

Micro Solid Oxide Fuel Cell Fabrication via Inkjet Printing

Hill T.Y., Reitz T.L., Huang H., Air Force Research Laboratory, US

Energy conversion and storage devices (ECSDs) are facing the challenge of manufacturing miniature dimensions and/or unconventional shapes. Furthermore, reducing the total device thickness can significantly reduce the internal resistance and potentially improve interfacial electrochemical kinetics [...]

Inkjet Design, Materials & Fabrication

MedeA: An environment for ICME starting with atoms, and what we can learn from it

Saxe P., Materials Design, Inc., US

ICME is a grand vision, but there is an enormous amount of work needed to bring together experiment and simulation across the entire spectrum of length- and time-scales to go from atoms to cars, airplanes, [...]

Resonance transmission of the electron wave through the nanofilms containing a magnetic quantum well

Sahakyan A.S., Movsesyan R.M., Kocharian A.N., California State University Los Angeles, US

The transmission of an electron wave through so called a magnetic resonance diode is considered in semiconductor nanofilms consisting of two nonmagnetic barriers separated by a quantum (magnetic) well subjected to an external magnetic field. [...]

A New Method to Fin-width Line Edge Roughness Effect Simulation of FinFET Performance

Zhu Y., Zhao W., Wang W., Wu W., Feng Z., He J., He P., He J., He P., Song L., Peking University Shenzhen SOC Key Laboratory, CN

This paper developed a full three-dimensional (3-D) statistical simulation method to investigate Fin-width Line Edge Roughness (LER) effect on the FinFETs performance. The line edge roughness is introduced by Matlab program, and then the intrinsic [...]

A Full Differential Charge Pump Based on Symmetrical Complementary Half-Current Circuit Architecture

Huang Q., Zhao W., Wang W., Wu W., Du C., Feng Z., He J., He P., He J., He P., Song L., Peking University Shenzhen SOC Key Laboratory, CN

A full differential charge pump with low current mismatch and deviation is designed in this paper based on the symmetric complementary half-current circuit architecture. It adopts two symmetrical complementary P-N replica circuits with half value [...]

Nonholonomic Ab Initio Molecular Dynamics for Computational Materials Design

Fahrenthold E., University of Texas at Austin, US

Nanocomposites research attempts to design new materials with unique or optimized properties, by forming composites at the nanoscale. Previous work has demonstrated the ability to significantly modify the mechanical, electrical, magnetic, thermal, or chemical properties [...]

Multiscale Modeling of Organic-Inorganic Semiconductor Materials: Opportunities and Challenges

Stevenson J., Saathoff J., Clancy P., Cornell University, US

Many of the most interesting new materials that show promise for solar photovoltaics, involve atomic species, like lead and selenium, that are non-traditional from the point of view of computational modeling. This poses a problem [...]

Sector: Advanced Materials & Manufacturing