Papers – Page 1030 – TechConnect Briefs

Systematic Design and Optimization of Multi-Material, Multi-Degree-of-Freedom Micro Actuators

Sigmund O., Technical University of Denmark, DK

The paper reports an automated method for the synthesis of multi-material, multi-degree-of-freedom micro actuators. The method is based on topology optimization, an iterative computational scheme consisting of alternating finite element analyses, sensitivity analyses and optimal [...]

Full-chip Process Simulation for Silicon DRC

Sahouria E., Granik Y., Cobb N., Toublan O., Mentor Graphics Corporation, US

We have developed fast IC process simulation technique based on an empirical resist and etch models to compute the silicon image of designs as large as a full ULSI chip. The simulated silicon image is [...]

Process Simulation for Contact Print Microlithography

Darhuber A.A., Miller S.M., Troian S.M., Wagner S., Princeton University, US

Using a combination of experiment and simulations, we have studied the conformation of liquid microstructures on both at and corrugated, chemically heterogeneous substrates. The artificial surface patterns, which define regions of different surface energy, induce [...]

Creation of 3D Surface Models from 2D Layouts for BEM Anaylysis

Spasojevic M., Ljung P., Bächtold M., Coyote Systems, Inc., US

In this paper we present a new approach to creation of 3D surface models of MEMS devices from 2D layout masks suitable for analysis using the Boundary Element Method (BEM) [1]. The algorithm is implemented [...]

Automated Mask-Layout and Process Synthesis for MEMS

Ma L., Antonsson E.K., California Institute of Technology, US

This paper presents a method for automated mask-layout and process synthesis for MEMS. The synthesis problem is approached by use of a genetic algorithm. For a given desired device shape, and several fabrication process choices, [...]

Multiscale Modeling of Stress-Mediated Diffusion in Silicon, Ab Initio to Continuum

Windl W., Laudon M., Daw M.S., Carlson N.N., Masquelier M.P., Motorola, Inc., US

The introduction of new ‘back end’ materials, as well as the further scaling of silicon device dimensions, has raised the level of stress in dvice structures. Current engineering simulations of diffusion neglect the direct effect [...]

Ultrasmall Devices: Are We Ready for Quantum Effects?

Ferry D.K., Arizona State University, US

It is clear that continued scaling of semiconductor devices will bring us to a regime with gate lengths of less than 70 nm within another decade. While there are questions to be answered in the [...]

Top Down Design of MEMS

Fedder G.K., Carnegie Mellon University, US

A top-down design flow for suspended MEMS is described, starting with schematic capture of a design topology, followed by behavioral simulation, layout generation, parasitic extraction, and final verification. Support for this flow requires a MEMS [...]

Automatic Device Design Optimization with TCAD Frameworks

Stockinger M., Selberherr S., Technical University of Vienna, AT

A design optimization method is presented which utilizes automatic optimization capabilities within TCAD frameworks. This method is applied to doping profile optimizations of ultra-low-power CMOS transistors with 0.25 and 0.1 um gate lengths. Two different [...]

CAD for Opto-Electronic Microsystems

Kurzweg T.P., Levitan S.P., Marchand P.J., Prough K.R., Chiarulli D.M., University of Pittsburgh, US

The use of MEMs technology has enabled the fabrica-tion of micro-optical and micro-electro-mechanical systems on a common substrate. This has led to new challenges in computer aided design of optical micro-electro-mechanical systems. We have extended [...]