wet etching – TechConnect Briefs

Electrochemical Nanoimprinting of Silicon: A Direct Patterning Approach

Azeredo B., Arizona State University, US

Soft-lithography and nanoimprinting lithography have been critical in manufacturing 3D features with sub-20 nm resolution onto polymeric materials which have often been employed for producing micro and nanoscale optical materials and surfaces. However, methods for [...]

Silicon Nanostructure Fabrication by Direct FIB Writing and TMAH Wet Chemical Etching

Sievilä P., Chekurov N., Tittonen I., Aalto University, FI

The development of nanotechnology based devices requires rapid prototyping methods that can be applied in combination with well-known clean room processing techniques. We show that focused ion beam (FIB) Ga+-ion implantation can be used to [...]

Three-dimensional Simulation method of Anisotropic Wet Chemical Etching Process

Lee J-G, Won T., Inha University, KR

Anisotropic wet chemical etching is still one of the fundamental techniques employed in silicon bulk micromaching. However, there are still unsolved problems with the simulation of the process. And most of the available simulation software [...]

Design of Compensation Structures for Anisotropic Etching

Long M.K, Burdick J.W., Antonsson E.K., California Institute of Technology, US

Due to the highly anisotropic behavior of ilicon bulk etching,there have been many publications on etch simulation and convex corner compensation for specific geometries. Our previous work introduced a general framework for algorithmically synthesizing mask [...]

Computer Aided Mask-Layout for Bulk Etch Fabrication

Long M.K, Burdick J.W., Antonsson E.K., California Institute of Technology, US

This paper presents a method to synthesize the mask layout geometry for a MEMS wet etching process. Given a desired part geometry, the method determines a candidate mask geometry that will etch to the final [...]