Unified Compact Model for Gate All Around FETs- Nanosheets, Nanowires, Multi Bridge Channel MOSFETs
Kushwaha P., Duarte J.P., Lin Y-K., Agarwal H., Chang H-L, Sachid A., Salahuddin S., Chauhan Y.S., Hu C., University of California Berkeley USA, US
FinFET is in mass production for its capability of scaling below 20nm. Thin silicon Fin surrounded by gate provides a superior channel electrostatics resulting in higher on current (Ion) and better subthreshold swing. The same [...]