Nanoelectronics – Page 13 – TechConnect Briefs

The C-TVA plasma source – a chemical vacuum thin film deposition tool

Surdu-Bob C.C., Badulescu M., INFLPR, RO

It is presented here for the first time the deposition of oxides, nitrides and oxinitride thin films by a new plasma source based on Thermionic Vacuum Arc plasma (TVA), called Compact-TVA (C-TVA). The source uses [...]

Synthesis of Stabilized Silver nanoparticles exposed to Hydrochloric Acid

Atta A.M., Allohedan H.A., Ezat A., Issa Z.A., King Saud Unversity, SA

The bioavailability of ingested silver nanoparticles (AgNPs) depends in large part on initial particle size, shape and surface coating, properties which will influence aggregation, solubility and chemical composition during transit of the gastrointestinal tract. In [...]

Characteristics of Grooving by Diamond Needle-Tip with Various Tip Shapes and Grooving Parameters

Mladenovic V., R&D - New technologies, SI

The fundamental goal of this study is to present effects on the material AISI with one of the micro-machining methods in modern security printing technology, such card production, needle tip engraving. This method is basically [...]

Electrically conductive polypropylene fibers and tapes

Martin F., Centre of Advanced Surface Engineering-AIN, ES

We report here the development of electrically conductive polypropylene MWCNT fibers and tapes with conductivities up to 70 S/m (8% wt) with a percolation threshold at 0.5%. Using a solution compounding method assisted by sonication [...]

Template-Free Single-Step Fabrication of Metal Oxide Hollow Nanospheres and Nanofoams

Jiang X., Changzhou University, CN

Hollow nanospheres and nanofoams possess characteristics such as low density, high surface area and adjustable refractive index that make them attractive to tune their mechanical, optical, electrical, and chemical properties for applications ranging from drug [...]

Three dimensional metal film catalyst assisted etching of silicon

Sheng W., Shi T., Sun B., Tan X., Jiang T., Liao G., Huazhong University of Science and Technology, CN

Recently metal assisted chemical etching of silicon has emerged as a promising low-cost technology for the fabrication of vertical aligned silicon nanowire arrays[1].The technology comprises two steps: depositing a layer of 2-D porous siliver film [...]

Topic: Nanoelectronics

The C-TVA plasma source – a chemical vacuum thin film deposition tool

Synthesis of Stabilized Silver nanoparticles exposed to Hydrochloric Acid

Characteristics of Grooving by Diamond Needle-Tip with Various Tip Shapes and Grooving Parameters

Electrically conductive polypropylene fibers and tapes

Template-Free Single-Step Fabrication of Metal Oxide Hollow Nanospheres and Nanofoams

Three dimensional metal film catalyst assisted etching of silicon

Single resonator GaN/Si SAW based temperature sensor

The role of target warming in the synthesis of silicon nanoparticles by picosecond laser ablation in liquid

3D Printing of Double Ka Band Helical Antenna

Fast, robust and simple all optical far-field nano-positioning measurements