We present a novel method for the nano-positioning measurement of a sample relying on symmetry considerations. In particular, we exploit the cylindrical symmetry of a control defect appended to the sample. The exact nature of the defect plays no role, but rather provides a scatterer fulfilling the cylindrical symmetry of the system only when aligned with the measurement apparatus. The position measurement is then retrieved from the spatial properties of a laser beam after its interaction with the defect. This far field method provides a deeply sub-wavelength precision and the possibility of rapidly retrieving the initial zero position. We believe that this method provides important advantages over current approaches. In addition, the optical equipment used for the experimental realization is simple and inexpensive, and do not involves the use of local probes. The system can be miniaturized to be easily appended to an existing system. Also, the possibility to implement triangulation methods for the recovery of the reference position has important implications to reduce the positioning time in complex multi-step processes.
Journal: TechConnect Briefs
Volume: 2, Nanotechnology 2013: Electronics, Devices, Fabrication, MEMS, Fluidics and Computational (Volume 2)
Published: May 12, 2013
Pages: 412 - 415
Industry sector: Advanced Materials & Manufacturing
Topicss: Advanced Manufacturing, Nanoelectronics