unified regional – TechConnect Briefs

Unified Regional Surface Potential for Modeling Common-Gate Symmetric/Asymmetric Double-Gate MOSFETs with Any Body Doping

See G.H., Zhou X., Zhu G., Zhu Z., Zhu G., Zhu Z., Lin S., Wei C., Zhang J., Srinivas A., Nanyang Technological University, SG

Double-gate MOSFET is one of the key potential devices to allow further extension of CMOS technology scaling. The compact modeling community faces great challenges to model the physical effects due to the coupling of the [...]

Unified Regional Surface Potential for Modeling Common-Gate Symmetric/Asymmetric Double-Gate MOSFETs with Quantum-Mechanical Effects

See G.H., Zhou X., Zhu G., Zhu Z., Zhu G., Zhu Z., Lin S., Wei C., Zhang J., Srinivas A., Nanyang Technological University, SG

The quantum mechanical effect (QME) in nanoscale MOSFETs has become more and more important. The quantization of the space charge density in bulk-MOS compact models is usually modeled by the van Dort model with a [...]

Unified Regional Charge-based MOSFET Model Calibration

See G.H., Chiah S.B., Zhou X., Chandrasekaran K., Shangguan W., Pandey S.M., Cheng M., Chu S., Hsia L.-C., Nanyang Technological University, SG

This paper presents a methodology to extract device physical parameters, i.e., electrical oxide thickness (tox), channel doping (Nch), and poly-gate doping (Ngate), as well as smoothing parameters in our unified regional charge-based model [1] with [...]

One-Iteration Parameter Extraction for Length/width-dependent Threshold Voltage and Unified Drain Current Model

Chiah S.B., Zhou X., Chandrasekaran K., See G.H., Shangguan W., Pandey S.M., Cheng M., Chu S., Hsia L.-C., Nanyang Technological University, SG

This paper presents calibration approach for our unified length/width-dependent MOSFET drain current (Ids) model [1] with the length/width-dependent threshold voltage (Vt) model [2] for technology characterization in the entire geometry/bias range for CMOS shallow trench [...]