nanolithography – TechConnect Briefs

Fabrication and Characterization of PEDOT Nanowires Based on Self Assembled Peptide Nanotube Lithography

Ormstrup Christiansen N., Andersen K.B., Castillo-León J., Svendsen W.E., Rozlosnik N., Technical University of Denmark, DK

In this article we demonstrate the use of self-assembled peptide nanotube structures as a masking material in a rapid, mild and low cost fabrication of PEDOT:TsO nanowire device. In this new fabrication approach the PEDOT:TsO [...]

Nano-scaled water ejection using Nanopipette with QTF-AFM for Nanolithography

An S.M., Jang S.J., Noh H.E., Jhe W.H., Seoul National University, KR

We demonstrated that the apex of nanopipette with applying electric field could be used as a nano-scaled water ejection system using AFM(Atomic Force Microscopy) System based on QTF(Quartz Tunning Fork), namely nanolithography system. The tip [...]

Molecular Dynamics of Self-Assembled Monolayer Formation in Soft Nanolithgoraphy

Heo D., Yang M., Jang J., Pusan National University, KR

Molecular dynamics simulation is performed to study the growth mechanism of self-assembled monolayer in the AFM tip-assisted soft nanolithography such as in dip-pen nanolithography [1]. We investigate how the droplet created around the tip spreads [...]

High resolution Nanolithography using Focused Ion Beam Scanning Electron Microscopy (FIB SEM)

Wilhelmi O., Roussel L, Stokes D.J., Hubert D.H.W., FEI Company, NL

State-of-the-art FIB technology combined with high-performance SEM is making a big impact on nanotechnology, particularly with the ability to use either focused ions or electrons to perform advanced nanolithography. Achieving the highest standards requires an [...]

Fabricating Nanoscale Features Using the 2-Step NERIME TSI Nanolithography Process

Gilmartin S.F., Arshak A., Arshak K., Collins D., Korostynska O., Arshak A., Arshak K., Analog Devices, IE

The 2-step negative resist image by dry etching (2-step NERIME) focused ion beam (FIB) top surface imaging (TSI) process is a novel nanolithography technique for creating nanometer scale resist features using conventional DNQ/novolak resists. The [...]

Surface Modification of Perovskite Manganite Thin Films using Atomic Force Microscopy

Schaefer D.M., Bolling C., Sunderland J., Davidson A., Kolagaani R., Bradley T., Ludka B., Towson University, US

Nanolithography using the atomic force microscope (AFM) is emerging as a promising tool for nanotechnology . We report our results of AFM- induced nanoscale surface modifications in thin films of the CMR manganite material La0.7Ba0.3MnO3. [...]

Enabling Nanofabrication through Dip Pen Nanolithography™

Eby R., Leckenby J., NanoInk Inc, US

Dip Pen Nanolithography, DPN™, was discovered in the laboratory of Dr Chad Mirkin at Northwestern University leading to the founding of NanoInk, Inc. with a mission to develop, manufacture and advance the process of DPN [...]

Metrology Development for the Nanoelectronics Industry at the National Institute of Standards and Technology

Dagata J.A., Richter C.A., Silver R.M., Vogel E., Martinez de Pinillos J.V., NIST, US

The National Institute of Standards and Technology has provided and continues to provide critical metrology development for the semiconductor manufacturing industry as it moves from the microelectronic era into the nanoelectronic era. This presentation will [...]

Scanning Probe Lithography on InAs Substrate

Houlet L.F., Yamaguchi H., Hirayama Y., NTT Basic Research Laboratories, NTT Corporation, JP

In this study, we focus our interest on patterning a conventional electron beam resist by electron field emission exposure using Atomic Force Microscope (AFM). We have fabricated 50-140 nm deep structures in InAs with the [...]

A Sub-40nm Nanostructured La0.7Sr0.3MnO3 Planar Magnetic Memory

Arnal T., Bibes M., Lecoeur Ph., Mercey B., Prellier W., Haghiri-Gosnet A.M., Institut d'Electronique Fondamentale IEF/UMR8622, FR

A single-step nanolithography planar process, which allows generating the core-element of a spin-polarized magnetic memory in the fully spin-polarized La0.7Sr0.3MnO3 (LSMO) manganite, is reported. Taking benefit of the proximity effects due to backscattered electrons, a [...]