high-k – TechConnect Briefs

Leakage current in HfO2 stacks: from physical to compact modeling

Larcher L., Padovani A., Pavan P., Università di Modena e Reggio Emilia, IT

First, we present a Monte-Carlo model we developed for describing the charge transport in hafnium-based stacks, which allows reproducing voltage and temperature dependencies of the leakage current along with its statistical distribution. The model accounts [...]

Dynamic Behavior Model for High-k MOSFETs

Dunga M.V., Xi X., Niknejad A.M., Hu C., University of California-Berkeley, US

High-K dielectrics need to be introduced into bulk CMOS to extend the scaling limits. However, the use of high-k dielectrics introduces new dynamic behavior into transistor operation. Pulsed measurements show hysteresis in drain current (Id), [...]

Inner Sidewall Gate MOSFET with HfO2 gate Dielectric and Pt electrode

Im K., Ahn C-G, Yang J.H., Baek I-B, Choi C-J, Lee S., Hwang H., Cho W-J, Choi C-J, Electronics and Telecommunications Research Institute, KR

UTB ISG MOSFET with gate length of 60 nm was fabricated with HfO2 gate dielectric and Pt gate electrode. The proposed device has some advantage over conventional replacement gate process. Besides simpler process, the remaining [...]

Nanoworld Semiconductor Industry – State and Future Challenges of Technology Computer Aided Design

Puchner H., Cypress Semiconductor, US

Several application examples of nanoscale techniques used to influence or enhance the understanding of material properties as well as processing behavior are presented. We will also present a review of first principle density functional theory [...]

Nanoworld Semiconductor Industry – State and Future Challenges of Technology Computer Aided Design

Puchner H., Cypress Semiconductor, US

Several application examples of nanoscale techniques used to influence or enhance the understanding of material properties as well as processing behavior are presented. We will also present a review of first principle density functional theory [...]