Nanoimprint Mold Manufacturing with Focused Ion Beam
Chung M., Huang B.R., Weng M.H., Fu C.S., Chang Y.Y., Lai S.W., Chiou J.M., Chen Y-C, Tzeng Y.H., Southern Taiwan University of Technology, TW
Nanoimprint lithography (NIL) is an emerging low cost technique for reproducing sub-100 nm pattern in various applications; however, manufacturing the mold for nanoimprint has been a key issue both in expense and resolution. Focused Ion [...]