The Effect of Growth Temperature on Aluminum Nanocrystal Embedded AlOxNy for Non-Volatile Memory
Chen N.H., Hsieh P-H, Huang F.S., Huang S-J, Huang F.S., Huang S-J, National Tsing Hua University, TW
The aim of this paper is to present a aluminum-based nonvolatile memory of Al2O3 (28 nm)/ Al-rich Al0.54O0.42N0.04 (22 nm)/ Al0.44O0.38N0.18 (3 nm) layered structure on SiO2 (2 nm)/ n-Si by a simple rapid thermal [...]