Davis J. – TechConnect Briefs

The Impact of Dielectric Coatings and Porosity of Nanoparticles on Energy Density

Davis J., Brown D., Henderson W., Anbalagan P., Georgia Institute of Technology, US

Using experimentally calibrated 3-D quasi-electrostatic simulations, various microstructural architectures of cold-pressed nanoparticle (NP) compacts for low-frequency energy storage applications are investigated. This work is built upon our investigations into metal-insulator composites [1] and dielectric composites [...]

Developing a Strategy for the Spatial Localisation and Autonomous Release of Silver Nanoparticles within Smart Implants

Newton L.A.A., Sharp D.G., Leslie R., Davis J., Nottingham Trent University, UK

A novel approach to the controlled release of silver nanoparticles from a solid state repository within microdevice/micro fluidic architectures is presented. The dynamics of their formation, mechanism and influence on particle formation and release characteristics [...]

Simple Method of Characterizing CMOS Channel Dopant Profiles Using CV Technique

Kapila D., Kulkarni M., Fernando C., Davis J., Vasanth K., Pollack G., Texas Instruments, Inc., US

In CMOS process and device simulations, characterization of complete dopant profiles in the channel region is essential for accurate simulations. We have developed a simple, fast and inexpensive methodology for characterizing CMOS channel dopant profiles [...]

Authors: Davis J.

The Impact of Dielectric Coatings and Porosity of Nanoparticles on Energy Density

Developing a Strategy for the Spatial Localisation and Autonomous Release of Silver Nanoparticles within Smart Implants

Simple Method of Characterizing CMOS Channel Dopant Profiles Using CV Technique

Yield Prediction Under Non-Standard Data Distributions

PSDesigner: A Framework for Transistor Co-Optimization

A Method of MOSFET Dopant Profile Prediction and its Use in Transistor Design