Impact of High-k gate oxide on intrinsic device Performance of Junctionless Transistor (JLT)
Borse H.S., Jawake A.V., Aher S.R., Bhosale K.S., Patil G.C., Patil S.R., Patil G.C., Patil S.R., Bormane D.S., JSPM’s Rajarshi Shahu College of Engineering, IN
Junctionless transistor (JLT) attracts the researchers due to its advantages over conventional MOSFET’s namely high scalability, simple process flow, and low thermal budget. However, scaling of JLT below 20 nm regime results increase in off [...]