Antonsson E.K. – TechConnect Briefs

A Framework for Mask-Layout Synthesis Implementing a Level Set Method Simulator

Lee C.-Y., Antonsson E.K., California Institute of Technology, US

Recently, evolutionary methods have been developed to automate MEMS mask-layout synthesis [3]{[6]. These design synthesis methods are iterative searches in which each iteration consists of mask-layout modification, determination of etched shape via an arbitrary 3-D [...]

Robust Mask-Layout Synthesis for MEMS

Ma L., Antonsson E.K., California Institute of Technology, US

A method for automated mask-layout and process synthesis for MEMS using Genetic Algorithms was proposed by Ma and Antonsson [5]. For a given desired device shape, and several fabrication process choices, this synthesis method will [...]

Self-Adapting Vertices for Mask-Layout Synthesis

Lee C.-Y., Antonsson E.K., California Institute of Technology, US

An efficient procedure for synthesizing MEMS mask-layouts for a desired 3-D shape is discussed. This method can greatly reduce the number of design and prototype iterations required to produce a desired device. The method is [...]

Automated Mask-Layout and Process Synthesis for MEMS

Ma L., Antonsson E.K., California Institute of Technology, US

This paper presents a method for automated mask-layout and process synthesis for MEMS. The synthesis problem is approached by use of a genetic algorithm. For a given desired device shape, and several fabrication process choices, [...]

Design of Compensation Structures for Anisotropic Etching

Long M.K, Burdick J.W., Antonsson E.K., California Institute of Technology, US

Due to the highly anisotropic behavior of ilicon bulk etching,there have been many publications on etch simulation and convex corner compensation for specific geometries. Our previous work introduced a general framework for algorithmically synthesizing mask [...]

Surface Reconstruction of Etched Contours

Lee C.-Y., Antonsson E.K., California Institute of Technology, US

Previously, a computationally efficient and geometrically accurate etching simulation was developed to compute con-tours of constant depth at different time steps [1]. Experi-mental verification of this early work has been established [2]. However, contours are [...]

Mask-Layout Synthesis Through an Evolutionary Algorithm

Li H., Antonsson E.K., California Institute of Technology, US

An automatic method for synthesizing MEMS mask-lay-outs is presented. This method uses evolutionary algorithm techniques to optimize the mask-layouts for a forward simu-lation of fabrication. Initially, a random population of mask-layouts is generated. The fabrication [...]

SEGS: On-line WWW Etch Simulator

Li G., Hubbard T., Antonsson E.K., Daltech-Dalhousie University, CA

This paper presents an interactive on-line wet etch simulator (SEGS) which predicts the etched shape as a function of time for arbitrary isotropic or anisotropic etchants and any initial mask shape. Using any Javaenabled web [...]

Computer Aided Mask-Layout for Bulk Etch Fabrication

Long M.K, Burdick J.W., Antonsson E.K., California Institute of Technology, US

This paper presents a method to synthesize the mask layout geometry for a MEMS wet etching process. Given a desired part geometry, the method determines a candidate mask geometry that will etch to the final [...]