A Framework for Mask-Layout Synthesis Implementing a Level Set Method Simulator


Keywords: , ,

Recently, evolutionary methods have been developed to automate MEMS mask-layout synthesis [3]{[6]. These design synthesis methods are iterative searches in which each iteration consists of mask-layout modification, determination of etched shape via an arbitrary 3-D etch simulator, and similarity evaluations between the etched shape and the desired shape, which is used to guide modification. The work described here differs from previous work in that a framework is developed for mask-layout synthesis that implements level set methods as the 3-D etch simulator.

PDF of paper:

Journal: TechConnect Briefs
Volume: 1, Technical Proceedings of the 2001 International Conference on Modeling and Simulation of Microsystems
Published: March 19, 2001
Pages: 438 - 441
Industry sector: Sensors, MEMS, Electronics
Topic: Modeling & Simulation of Microsystems
ISBN: 0-9708275-0-4