Industrial Technology Research Institute – Page 2

Planarize the Sidewall Ripples of Silicon Deep Reactive Ion Etching

Weng K-Y, Wang M-Y, Tsai P-H, Industrial Technology Research Institute, TW

In order to diminish the sidewall defects in silicon deep reactive ion etching process, depositing doped silicon dioxide and post-annealing processes are applied. Compared with conventional approaches, the filling-reflow surface shows nearly optical quality. the [...]

An Approach for Fabrication of Polymer-based Bio-analytical Microfluidic Devices

Wang M., Weng K-Y, Huang C-C, Liu W-P, Yao L-Y, Industrial Technology Research Institute, TW

Polymer is well suited as a substrate for bio-application devices due to its high dielectric constant, bio-compatible, low cost and ease of microfabrication. The primary goal is the successful fabrication of microchannels for biochip commonly [...]

Analysis of Anodic Bonding and Packaging Effects in Micro Sensors

Shing T-K, Industrial Technology Research Institute, TW

Anodic bonding is quite popular in making micro-sensors since it can bond sodium-rich glass to silicon or virtually any metals with good adhesion strength in lower temperature. It is well known that this process will [...]

Robust Design of Silicon Piezoresistive Pressure Sensors

Shing T-K, Industrial Technology Research Institute, TW

In order to analyze silicon piezoresistive pressure sensors, several methods are used to obtain the stress distribution for different sizes and config,urations of square diaphragm type silicon pressure sensors. Furthermore, through integral considerations and thoughtful [...]